Hydrogen-included Plasma-assisted Reactive Sputtering for Conductivity Control of Ultra-Wide Bandgap Amorphous Gallium Oxide

Publication Information

Title

Japanese:	Hydrogen-included Plasma-assisted Reactive Sputtering for Conductivity Control of Ultra-Wide Bandgap Amorphous Gallium Oxide
English:	Hydrogen-included Plasma-assisted Reactive Sputtering for Conductivity Control of Ultra-Wide Bandgap Amorphous Gallium Oxide

Author

Japanese:	Kosuke Takenaka, Hibiki Komatsu, Taichi Sagano, Keisuke Ide, Susumu Toko, Takayoshi Katase, Toshio Kamiya, Yuichi Setsuhara.
English:	Kosuke Takenaka, Hibiki Komatsu, Taichi Sagano, Keisuke Ide, Susumu Toko, Takayoshi Katase, Toshio Kamiya, Yuichi Setsuhara.

Language

English

Journal/Book name

Japanese:	Jpn. J. Appl. Phys.
English:	Jpn. J. Appl. Phys.

Volume, Number, Page

Vol. 63 pp. 04SP65

Published date

Aug. 17, 2024

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English: