Impact of Oxygen Pressure and Substrate Temperature on Epitaxial Film Growth of Rutile-type GeO2

Publication Information

Title

Japanese:	Impact of Oxygen Pressure and Substrate Temperature on Epitaxial Film Growth of Rutile-type GeO2
English:	Impact of Oxygen Pressure and Substrate Temperature on Epitaxial Film Growth of Rutile-type GeO2

Author

Japanese:	Tomoya Suzuki, Kaname Sakaban, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya.
English:	Tomoya Suzuki, Kaname Sakaban, Takayoshi Katase, Hidenori Hiramatsu, Hideo Hosono, Toshio Kamiya.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Oct. 8, 2024

Publisher

Japanese:
English:

Conference name

Japanese:	The Fourteenth International Conference on the Science and Technology for Advanced Ceramics (STAC14)
English:	The Fourteenth International Conference on the Science and Technology for Advanced Ceramics (STAC14)

Conference site

Japanese:	横浜
English:	Yokohama