Novel SOI Fabrication Process Utilizing the Selective Etching for Si/SiGe Stacked Layers: Separation by Bonding Si Islands Technology (SBSI)
著者
和文:
S. Ohmi,
H. Ohri,
T. Yamazaki,
M. Sakuraba,
J. Murota,
T. Sakai.
英文:
S. Ohmi,
H. Ohri,
T. Yamazaki,
M. Sakuraba,
J. Murota,
T. Sakai.
言語
English
掲載誌/書名
和文:
英文:
Third International Workshop on New Group IV (Si-Ge-C) Semiconductors: Control of properties and applications to ultrahigh speed and opto-electronic devices
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