Fabrication of GaN-based striped structures along the <1120> direction by the combination of RIE dry-etching and KOH wet-etching techniques to recover dry-etching damage
著者
和文:
M. Itoh,
T. Kinoshita,
K. Kawasaki,
M. Takeuchi,
C. Koike,
Y. Aoyagi.
英文:
M. Itoh,
T. Kinoshita,
K. Kawasaki,
M. Takeuchi,
C. Koike,
Y. Aoyagi.
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