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タイトル
和文: 
英文:Oxygen sensitivity of SrTiO3 thin film prepared using atomic layer deposition 
著者
和文: 原亨, 石黒 隆.  
英文: Toru Hara, Takashi Ishiguro.  
言語 English 
掲載誌/書名
和文: 
英文:Sens. & Actuators 
巻, 号, ページ Vol. B 136        p. 489
出版年月 2008年12月 
出版者
和文: 
英文:Elsevier 
会議名称
和文: 
英文: 
開催地
和文: 
英文: 
公式リンク http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6THH-4V70NB9-6&_user=126251&_coverDate=03%2F02%2F2009&_rdoc=35&_fmt=high&_orig=browse&_srch=doc-info(%23toc%235283%232009%23998639997%23920073%23FLA%23display%23Volume)&_cdi=5283&_sort=d&_docanchor=&_ct=46&_acct=C000010218&_version=1&_urlVersion=0&_userid=126251&md5=6a3a45921406d52c8bccd13c8edb2765
 
DOI https://doi.org/10.1016/j.snb.2008.12.026
アブストラクト A strontium titanate (SrTiO3) thin film showed high oxygen sensitivity on the ppb order at room temperature. The sensitivity is enough to monitor oxygen contamination in semiconductor manufacturing processes, which is becoming increasingly important as semiconductor devices are scaled down to the nanometer generation. The SrTiO3 film was prepared using atomic layer deposition (ALD), which has been established and found suitable for mass production.

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