Materials Research Society Symposium Proceedings (edited by I. Takeuchi, J. M. Newsam, L. T. Wille, H. Koinuma and E. J. Amis)
巻, 号, ページ
Vol. 700
pp. 125-130
出版年月
2002年1月
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We report on the development of a high throughput x-ray diffractometer (XRD) that concurrently measures spatially resolved x-ray diffraction (XRD) spectra of epitaxial thin films integrated on a substrate. A convergent x-ray is focused into a stripe on a substrate and the diffracted beam is detected with a two-dimensional x-ray detector, so that the snapshot image represents a mapping of XRD intensity with the axes of the diffraction angle and the position in the sample. High throughput characterization of crystalline structure is carried out for a BaxSr1-xTiO3 composition-spread film on a SrTiO3 substrate. Not only the continuous spread of the composition (x), but also the continuous spread of the growth temperature (T) are given to the film by employing a special heating method. The boundary between the strained lattice and relaxed lattice is visualized by the concurrent XRD as function of x and T in a high throughput fashion.
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