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タイトル
和文: 
英文:Kinetic model and spectroscopic measurement of NO (A, B, C) states in low-pressure N2–O2 microwave discharge 
著者
和文: 譚浩, 根津篤, 赤塚洋.  
英文: Hao Tan, Atsushi Nezu, Hiroshi Akatsuka.  
言語 English 
掲載誌/書名
和文: 
英文:Japanese Journal of Applied Physics 
巻, 号, ページ Vol. 54    No. 9    096103
出版年月 2015年8月27日 
出版者
和文: 
英文:The Japan Society of Applied Physics 
会議名称
和文: 
英文: 
開催地
和文: 
英文: 
公式リンク http://iopscience.iop.org/1347-4065/54/9/096103/
 
DOI https://doi.org/10.7567/JJAP.54.096103
アブストラクト A self-consistent kinetic model is developed to study the atomic and molecular processes in the microwave discharge plasma of N2–O2 mixtures. We focus on the NO A 2Σ+, B 2Π, and C 2Π states in the mixture discharge. We find good agreement between the calculated and experimental NO A 2Σ+ densities. On the other hand, the radiation bands from the NO B 2Π and C 2Π states are observed only when the oxygen partial pressure is less than 3%. We discuss the de-excitation processes for the NO B 2Π and C 2Π states in this low-pressure plasma. We also propose that the de-excitation processes involve collision with O2 X 3Σg– for these levels, which can explain the observed spectral disappearance.

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