We focus on the Kelvin probe force microscopy (KPFM), that can measure the surface potential on nanostructure. Using the KPFM, we may observe the electric field enhancement directly and may compare them to the simulation results.
In this study, incident-light wavelength dependence and structural dependence were examined on gold nanodisks (500 nm diameter and 30 nm thickness) prepared on Si substrate using electron beam lithography and lift-off method. Two types of array were prepared; one was “Regular array”, all distance between edge-to-edge of disks were 500 nm, and another was “Quadrupole array”, Quadrupole was comprised of four disks, the distance between edge-to-edge of disks were set to 50 nm in the x direction and y direction, and the distance between quadrupoles were set to 500nm in the x direction and y direction.
For each arrays, reflection spectra of the portion containing the gold disk were measured by UV-Vis spectra connected to optical microscope for a range of a circle with a 3 m diameter and Si substrate was used for the reference. Also, KPFM measurements were carried out on each arrays at two conditions: unirradiated state and under monochromatic light irradiation.
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