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タイトル
和文: 
英文:Excitation-kinetic model for argon processing plasma diagnostics by optical emission spectroscopic measurement based on collisional-radiative model 
著者
和文: 山下雄也, 赤塚洋.  
英文: Yuya Yamashita, Hiroshi Akatsuka.  
言語 English 
掲載誌/書名
和文: 
英文:Proceedings of International Syhmposium on Dry Process 
巻, 号, ページ         pp. 83 - 84
出版年月 2017年11月16日 
出版者
和文: 
英文:International Syhmposium on Dry Process Organizing Committees 
会議名称
和文: 
英文:39th International Syhmposium on Dry Process 
開催地
和文:東京 
英文:Tokyo 
公式リンク http://www.dry-process.org/2017/index.html
 
アブストラクト To measure electron temperature and density of argon processing plasma by optical emission spectroscopic measurement, we made the excitation-kinetic models to describe excited-states densities, based on collisional-radiative model. The models tuned for a limited range of the electron temperature and density independent of the Griem's boundary can approximate the real excitation-kinetics well. Further prospects are discussed in terms of the excitation-kinetic models.

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