Home >

news ヘルプ

論文・著書情報


タイトル
和文: 
英文:Genetic-algorithm-assisted reconstruction of arbitrary EEDF of atmospheric-pressure plasma using optical emission spectroscopic measurement 
著者
和文: Thijs Van Der Gaag, 赤塚洋.  
英文: Thijs Van Der Gaag, Hiroshi Akatsuka.  
言語 English 
掲載誌/書名
和文: 
英文:Bull. Am. Phys. Soc. 
巻, 号, ページ        
出版年月 2019年10月29日 
出版者
和文: 
英文:American Physical Society 
会議名称
和文: 
英文:72nd Annual Gaseous Electronics Conference (GEC) 
開催地
和文:カレッジステーション 
英文:College Station, TX 
公式リンク http://meetings.aps.org/Meeting/GEC19/Session/FT1.31
 
アブストラクト Recent increased interest in non-equilibrium atmospheric pressure plasma applications in e.g. medical treatments and agriculture leads to a need for more insight in the behavior of these plasmas. Knowledge of the electron energy distribution function (EEDF) is a central element in understanding the plasma state, making it worthwhile to expand our knowledge beyond the existing EEDF models. Here, a method is developed to determine the EEDF based on optical emission spectroscopic measurement meaning that the use of probes is not needed. Under atmospheric conditions, electron-atom bremsstrahlung is considered to be the dominant source of continuum emission. A genetic algorithm is used to match a unique, arbitrary EEDF solution to the emissivity data. With realistically available OES data (300-800nm), an accurate and complete (up to 20 eV) EEDF can be obtained using this algorithm. The current state of the algorithm, validation results by comparison to EEDF models and potential applications will be discussed.

©2007 Institute of Science Tokyo All rights reserved.