"Eisuke Tokumitsu,Isahaya Yamamura,Shiro Hino,Naruhisa Miura,Masayuki Imaizumi,Hiroaki Sumitani,Tatsuo Oomori","Comparative Study of Metalorganic Chemical Vapour Deposition of HfO2 and Al2O3 Gate Insulators on SiC for Power MOSFET Applications","WoDiM 2012(17th Workshop on Dielectrics in  Microelectronics)",,,,,,2012,June
"山村勇速,徳光永輔,日野史郎,三浦 成久,大森 達夫","MOCVD法によるSiC上へのHfO2膜の堆積とHfO2/SiO2/4H-SiC MOSFETの作製","第58回応用物理学関係連合講演会",,,,,,2011,Mar.