"Y. Nakamura,K. Kakushima,Y. Kataoka,A. Nishiyama,H. Wakabayashi,N. Sugii,K. Tsutsui,K. Natori,H. Iwai","Measurement of flat-band voltage shift using multi-stacked dielectric film","The Workshop on Future Trend of Nanoelectronics: WIMNACT",,,,,,2014,Feb.
"K. Tuokedaerhan,Shuhei Hosoda,Yoshinori Nakamura,Kuniyuki KAKUSHIMA,•ะ‰ชD‘ฅ,ผŽRฒ,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","Influence of Carbon Incorporation in W Gate Electrode for La-silicate Gate Dielectrics","2013 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES-SCINCE AND TECHNOLOGY",,,,,,2014,
"Yoshinori Nakamura,Kuniyuki KAKUSHIMA,•ะ‰ชD‘ฅ,Akira Nishiyama,Hitoshi Wakabayashi,Nobuyuki Sugii,HIROSHI IWAI","Measurement of flat-band voltage shift using multi-stacked dielectric film","The Workshop on Future Trend of Nanoelectronics:WIMNACT 39",,,,,,2014,
"’†‘บ‰รŠ๎,ื“cC•ฝ,Tuokedaerhan Kamale,Šp“ˆ–M”V,•ะ‰ชD‘ฅ,ผŽRฒ,Žแ—ัฎ,™ˆไM”V,“›ˆไˆ๊ถ,–ผŽๆŒค“๑,Šโˆไ—m","W2CƒQ[ƒg“d‹ษ‚ฦLa-silicateƒQ[ƒgโ‰–Œ‚๐—p‚ข‚ฝMOSƒLƒƒƒpƒVƒ^‚ฬM—Šซ•]‰ฟ","‘ๆ74‰๑‰ž—p•จ—Šw‰๏H‹GŠwpu‰‰‰๏",,,,,,2013,