"Ahmed Awad,Atsushi Takahashi,Satoshi Tanaka,Chikaaki Kodama","A Fast Process-Variation-Aware Mask Optimization Algorithm With a Novel Intensity Modeling",,"IEEE Transactions on Very Large Scale Integration (VLSI) Systems",,"Vol. 25","No. 3","pp. 998-1011",2017,Mar.
"Ahmed Awad,Atsushi Takahashi,Satoshi Tanaka,Chikaaki Kodama","Intensity Difference Map (IDM) Accuracy Analysis for OPC Efficiency Verification and Further Enhancement",,"IPSJ Trans. on System LSI Design Methodology",,"Vol. 10",,"pp. 28-38",2017,Feb.
"Ahmed Awad,Atsushi Takahashi,Chikaaki Kodama","A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model",,"IEICE Trans. Fundamentals",,"Vol. E99-A","No. 12","pp. 2363-2374",2016,Dec.
"Ahmed Awad","Robust Lithographic Mask Generation For Advanced Technology Nodes",,,,,,,2016,Sept.
"Ahmed Awad","Robust Lithographic Mask Generation For Advanced Technology Nodes",,,,,,,2016,Sept.
"Ahmed Awad","Robust Lithographic Mask Generation For Advanced Technology Nodes",,,,,,,2016,Sept.
"Ahmed Awad","Robust Lithographic Mask Generation For Advanced Technology Nodes",,,,,,,2016,Sept.
"Ahmed Awad,Atsushi Takahashi","A Lithographic Mask Manufacturability and Pattern Fidelity Aware OPC Algorithm",,"Proc. International Symposium on VLSI Design, Automation and Test (VLSI-DAT 2016)",,,,"pp. 1-4",2016,Apr.
"Ahmed Awad,Atsushi Takahashi,Chikaaki Kodama","A Fast Manufacturability Aware Optical Proximity Correction (OPC) Algorithm with Adaptive Wafer Image Estimation",,"Proc.  Design, Automation and Test in Europe (DATE 2016)",,,,"pp. 49-54",2016,Mar.
"Ahmed Awad,Atsushi Takahashi","Mask Manufacturability Aware Post OPC Algorithm For Optical Lithography",,"Proc. DA Symposium 2015, IPSJ Symposium Series",,"Vol. 2015",,"pp. 119-124",2015,Aug.
"Ahmed Awad,Atsushi Takahashi","A Fast Lithographic Mask Correction Algorithm","Technical Committee on VLSI Design Technologies","IEICE Technical Report (VLD2014-153)",,"Vol. 114","No. 476","pp. 1-6",2015,Mar.
"Atsushi Takahashi,Ahmed Awad,Yukihide Kohira,Tomomi Matsui,Chikaaki Kodama,Shigeki Nojima,Satoshi Tanaka","[Invited] Multi Patterning Techniques for Manufacturability Enhancement in Optical Lithography",,"Proc. the 2014 International Conference on Integrated Circuits, Design, and Verification (ICDV 2014)",,,,"pp. 117-122",2014,Nov.
"Ahmed Awad,Atsushi Takahashi,Satoshi Tanaka,Chikaaki Kodama","A Fast Process Variation and Pattern Fidelity Aware Mask Optimization Algorithm",,"Proc. IEEE/ACM 2014 International Conference on Computer-Aided Design (ICCAD 2014)",,,,"pp. 238-245",2014,Nov.
"Ahmed Awad,Atsushi Takahashi,Satoshi Tanaka,Chikaaki Kodama","A Process Variability Band Area Reduction Algorithm For Optical Lithography",,"Proc. the 2014 IEICE Society Conference (A-3-6)",,"Vol. A",,"p. 50",2014,Sept.
"Ahmed Awad,Atsushi Takahashi,Satoshi Tanaka,Chikaaki Kodama","Mask Optimization With Minimal Number of Convolutions Using Intensity Difference Map",,"Proc. DA Symposium 2014, IPSJ Symposium Series",,"Vol. 2014",,"pp. 145-150",2014,Aug.
"Ahmed Awad,Atsushi Takahashi,Satoshi Tanaka,Chikaaki Kodama","A New Intensity Based Edge Placement Error Optimization Algorithm for Optical Lithography",,"Proc. the 27th Workshop on Circuits and Systems",,,,"pp. 422-427",2014,Aug.