"Lin,A. Tanaka,N. Ishizaki,A. Nishiyama,N. Wakiya,J. S. Cross,T. Shiota,O. Sakurai,K. Shinozaki","Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3","The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)","Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)",,,,"  26pKP27",2014,June
"田中 敦,宇津木貴太,石崎超矢,西山昭雄,塩田 忠,櫻井 修,篠崎和夫,脇谷尚樹","Al(CH<sub>3</sub>)<sub>3</sub>を原料とするMOCVD法によるAl<sub>2</sub>O<sub>3</sub>薄膜の製膜過程","日本セラミックス協会第29回関東支部研究発表会","日本セラミックス協会第29回関東支部研究発表会予稿集",,,,"  2A04",2013,Sept.
"石崎超矢,田中 敦,西山昭雄,塩田 忠,櫻井 修,篠崎和夫,脇谷尚樹","MOCVD法によるSi基板上へのアルミナ薄膜の形成","日本セラミックス協会第32回エレクトロセラミックス研究討論会","日本セラミックス協会第32回エレクトロセラミックス研究討論会講演予稿集",,,"  2P10","p. 50",2012,Oct.