"Chunfu LIN,Takashi TANAKA,Akio NISHIYAMA,Tadashi SHIOTA,Osamu SAKURAI,Naoki WAKIYA,Kazuo SHINOZAKI,Kouichi YASUDA","Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum",,"J. Ceram. Soc. Japan","The Ceramic Society of Japan","Vol. 127","No. 6","pp. 443-450",2019,June
"Takashi Tanaka,Naoki Wakiya,Akira Osada,Osamu Sakurai,Kazuo Shinozaki","Effect of [001] Oriented Cr<sub>2</sub>O<sub>3</sub> Buffer Layer on Crystalline Al<sub>2</sub>O<sub>3</sub> Thin Film","The 3rd International Conference on Science and Technology for Advanced Ceramics (STAC3).","The 3rd International Conference on Science and Technology for Advanced Ceramics (STAC3).",,,"No. 16pP046",,2009,June
"“c’†‹MŽi,‹g‰ª•ü•F,˜e’J�®Ž÷,’·“c�W,“c’†�‡ŽO,ŽÂ�è˜a•v","MOCVD–@‚É‚æ‚éAl<sub>2</sub>O<sub>3</sub>”––Œ‚Ì�ì�»","‘æ24‰ñ“ú–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰ïŠÖ“ŒŽx•”Œ¤‹†”­•\‰ï","‘æ24‰ñ“ú–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰ïŠÖ“ŒŽx•”Œ¤‹†”­•\‰ï",,,"No. 1A01","p. 1",2008,July