"—Ρ r•α,ΌŽRΊ—Y,‰–“c’‰,ˆΐ“cŒφ ˆκ,ŽΒθ˜a•v","Al(CH3)3‚ΖO2‚π—p‚’‚½MOCVD –@‚Ι‚ζ‚ιAl2O3»–Œ‚Ι‹y‚Ϊ‚·H2“Y‰Α‚Μ‰e‹Ώ","“ϊ–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰ο2018”N”N‰ο","“ϊ–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰ο2018”N”N‰ο—vŽ|W",,,,,2018,Mar.
"—яr•α,“c’† “Φ,ΌŽR Ί—Y,‰–“c ’‰,ŸNˆδC,ŽΒθ ˜a•v","Fabrication of a-Al2O3 thin films at lower temperature by low pressure MOCVD","‘ζ4‰ρ“ϊ–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰οŠΦ“ŒŽx•”ŽαŽθŒ€‹†”­•\Œπ—¬‰ο","‘ζ4‰ρ“ϊ–{ƒZƒ‰ƒ~ƒbƒNƒX‹¦‰οŠΦ“ŒŽx•”ŽαŽθŒ€‹†”­•\Œπ—¬‰οu‰‰—vŽ|W",,,,"  43",2014,Oct.
"Lin,A. Tanaka,N. Ishizaki,A. Nishiyama,N. Wakiya,J. S. Cross,T. Shiota,O. Sakurai,K. Shinozaki","Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3","The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)","Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)",,,,"  26pKP27",2014,June