"•�“c �‚Žu,�¬–ì —½,‘�ŠÔ —D‘¾,Žë–ì ŠG”ü,�@“c ˆÉ—�–ç,Žá—Ñ �®,ŒÜ�\—’ �M�s","ƒXƒpƒbƒ^�¬–ŒMoS2‚ÌŠî”Â�ã‚Å‚ÌŒ´Žq•ª‰ð”\“dŽqŒ°”÷‹¾ŠÏŽ@","‘æ84‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2023,Sept.
"Shinya Imai,Ryo Ono,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Shigetaka Tomiya,Kazuo Tsutsui,Hitoshi Wakabayashi","Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"Ryo Ono,Shinya Imai,Takamasa Kawanago,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"Masaki Otomo,Masaya Hamada,Ryo Ono,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Chemical states of PVD-ZrS2 film underneath scaled high-k film with self-oxidized ZrO2 film as interfacial layer",,"Japanese Journal of Applied Physics","IOP Publishing","Vol. 62",,"p. SC1015",2023,Jan.
"�¡ˆä �T–ç,�¬–ì —½,�@“c ˆÉ—�–ç,Šp“ˆ –M”V,’C–¤ “N–ç,•y’J –Η²,“›ˆä ˆê�¶,Žá—Ñ �®","MoS2–ŒŽ¿‚̃Xƒpƒbƒ^�¬–ŒƒŒ�[ƒgˆË‘¶�«’²�¸","‘æ83‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2022,Sept.
"�¬–ì —½,�¡ˆä �T–ç,�@“c ˆÉ—�–ç,Šp“ˆ –M”V,“›ˆä ˆê�¶,Žá—Ñ �®","”÷Œ‹�»MoS2–Œ‚Ö‚Ì—°‰©•µˆÍ‹CƒAƒj�[ƒ‹‚É‚æ‚錋�»�«Œü�ã","‘æ83‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2022,Sept.
"Ryo Ono,Shinya Imai,Yuta Kusama,Takuya Hamada,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Emi Kano,Nobuyuki Ikarashi,Hitoshi Wakabayash","Elucidation of PVD MoS2 Film Formation Process and its Structure Focusing on Sub-Monolayer Region",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61",,,2022,Feb.