"Yoshiyuki Seki,Yutaka Sawada,Hiroshi Funakubo,Kazuhisa Kawano,Noriaki Oshima","Preparation of iridium metal films by spray chemical vapor deposition",,"MRS Advances",,,,,2020,Feb.
"Kazuhisa Kawano,Yoshiyuki Seki,Yutaka Sawada,Hiroshi Funakubo,Noriaki Oshima","Good Step Coverage of Iridium Metal Films by Spray CVD","2019 MRS Fall Meeting & Exhibit",,,,,,2019,Dec.
"Hirokazu Chiba,Masaki Hirano,Kazuhisa Kawano,Noriaki Oshima,Hiroshi Funakubo","Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition",,"Materials Science in Semiconductor Processing",,"vol. 70",,"pp. 73?77",2017,Nov.
"Hirokazu CHIBA,Masaki HIRANO,Kazuhisa KAWANO,Noriaki OSHIMA,Hiroshi FUNAKUBO","Effects of substrate surface composition and deposition temperature on deposition of flat and continuous Ru thin films",,"Journal of the Ceramic Society of Japan",,"vol. 124","no. 6",,2016,June
"Hiroshi Funakubo,Takahisa Shiraishi,Takahiro Oikawa,Masaki Hirano,Hirokazu Chiba and,Kazuhisa Kawano","Effect of Incubation Time on Preparation of Continuous and Flat Ru Films",,"J. Vac. Sci. Technol. A.",,"Vol. 33","No. 1","pp. 01A149-1-6",2015,Jan.
"Masaki Hirano,Kazuhisa Kawano,Hiroshi Funakubo","Effect of incubation time on deposition behavior of Ruthenium films by MOCVD using (2,4-Dimethy lpentadienyl) (ethylcyclopentadienyl) Ruthenium",,"Key Engineering Materials",,"Vol. 421-422",,"pp. 87-90",2010,
"Kazuhisa Kawano,Hiroaki Kosuge,Noriaki Oshima,Tadashi Arii,Yutaka Sawada,Hiroshi Funakubo","Ligand Structure Effect on A Divalent Ruthenium Precursor for MOCVD",,"Mater. Res. Soc. Symp. Proc.",,"Vol. 1155",,"pp. 1155-C09-11",2009,
"Kazuhisa Kawano,Hiroaki Kosuge,Noriaki Oshima,Hiroshi Funakubo","The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD",,"Electrochem. Solid-State Lett.",,"Vol. 12","No. 10","pp. D80-D83",2009,
"Kazuhisa Kawano,Hiroaki Kosuge,Noriaki Oshima,Hiroshi Funakubo","gLow-Temperature Preparation of Metallic Ruthenium Films by MOCVD Using Bis(2,4-dimethylpentadienyl)rutheniumh",,"Electrochem. Solid-State Lett.",,"Vol. 10","No. 6","pp. D60-D62",2007,