"Shotaro Yamazaki,Yoshifumi Nakamine,Ran Zheng,Masahiro Kouge,Tetsuya Ishikawa,Koichi Usami,Tetsuo Kodera,Yukio Kawano,Shunri Oda","Formation of three-dimensionally integrated nanocrystalline silicon particles by dip-coating method",,"Japanese Journal of Applied Physics",,"Vol. 54",,"pp. 105001-5",2015,Sept.
"高下雅央,石川哲也,宇佐美浩一,小寺哲夫,内田 建,小田俊理","凹凸基板を用いたディップコーティング法によるナノ結晶シリコンの集積化技術","第71回応用物理学会学術講演会",,,"  17a-ZB-4",,,2010,Sept.
"Tetsuya Ishikawa,Hiroki Nikaido,kouichi usami,Ken Uchida,Shunri Oda","Formation of two-dimensional array of Si nanocrystals using nano Si ink","G-COE PICE International Symposium on Silicon Nano Devices in 2030",,,,,,2009,Oct.
"T. Ishikawa,H. Nikaido,Kouichi Usami,K. Uchida,S. Oda","Fabrication of nano Si ink and two-dimensionally assembled Si nanocrystals","35th International Conference on Micro & Nano Engineering",,,,,,2009,Sept.
"二階堂広基,石川哲也,内田 建,小田俊理","Langmuir-Blodgett法によるナノ結晶シリコン量子ドットの集積配列","第70回応用物理学会学術講演会",,,,,,2009,Sept.