"T. Akushichi,Y. Takamura,Y. Shiotsu,S. Yamamoto,S. Sugahara","Spin Injection Behavior of CoFe/MgO/Si Tunnel Contacts: Effects of Radical Oxygen Annealing",,"J. Electron. Mater.",,"vol. 52",,"pp. 6902-6910",2023,Aug. "清野稔仁,悪七泰樹,菅原聡","CoFe/HfO2/Siスピン注入源の作製と評価","第64回応用物理学会春季学術講演会",,," 16a-501-11",,,2017,Mar. "T. Akushichi,D. Kitagata,Y. Shuto,S. Sugahara","Analysis of Spin Accumulation in a Si Channel Using CoFe/MgO/Si Spin Injectors","Electron Device Technology and Manufacturing Conference",,," P-15",,,2017,Feb. "北形大樹,悪七泰樹,菅原聡","電界アシスト4端子非局所MOSデバイスの解析と設計","第21回スピン工学の基礎と応用 (PASPS-21)",,," E-3",,,2016,Dec. "清野稔仁,悪七泰樹,菅原聡","CoFe/Hf系酸化物/Siスピン注入源の作製と評価","第21回スピン工学の基礎と応用 (PASPS-21)",,," P-12",,,2016,Dec. "D. Kitagata,T. Akushichi,Y. Takamura,Y. Shuto,S. Sugahara","Robust Design of Electric-field-assisted Nonlocal Si-MOS Spin-devices","2016 IEEE Silicon Nanoelectronics Workshop (SNW 2016)",,," P2-23",,"pp. 200-201",2016,June "T. Akushichi,D. Kitagata,Y. Takamura,Y. Shuto,S. Sugahara","Spin Accumulation in a Si Channel using High-Quality CoFe/MgO/Si Spin Injectors","2016 IEEE Silicon Nanoelectronics Workshop (SNW 2016)",,," P1-27",,,2016,June "D. Kitagata,T. Akushichi,Y. Takamura,Y. Shuto,S. Sugahara","Design and analysis of electric-field-assisted nonlocal silicon-channel spin devices","2015 IEEE Silicon Nanoelectronics Workshop (SNW2015)",,,,,,2015,June "T. Akushichi,Y. Takamura,Y. Shuto,S. Sugahara","Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with high quality tunnel barriers prepared by radical-oxygen annealing",,"J. Appl. Phys.","AIP Publishing LLC","Vol. 117","No. 17","pp. 17B531/1-4",2015,May "Y. Takamura,T. Akushichi,Y. Shuto,S. Sugahara","Analysis and design of nonlocal spin devices with electric-field-induced spin-transport acceleration",,"J. Appl. Phys.","AIP Publishing LLC","Vol. 117","No. 17","pp. 17D919/1-4",2015,Apr. "Y. Kawame,T. Akushichi,Y. Takamura,Y. Shuto,S. Sugahara","Fabrication and characterization of spin injector using a high-quality B2-ordered-Co2FeSi0.5Al0.5/MgO/Si(100) tunnel contact",,"J. Appl. Phys.","AIP Publishing LLC","Vol. 117","No. 17","pp. 17D151/1-3",2015,Apr. "周藤悠介,高橋克典,悪七泰樹,?村陽太,菅原聡","CoFe/TIO2/Siスピン注入源の作製と評価","第 19 回半導体スピン工学の基礎と応用 PASPS-19",,," P-18",,,2014,Dec. "悪七泰樹,?村陽太,周藤悠介,菅原聡","高品質CoFe/MgO/SiおよびCoFe/AlOx/Siトンネルコンタクトを用いた Siチャネルへのスピン注入","第 19 回半導体スピン工学の基礎と応用 PASPS-19",,," O-5",,,2014,Dec. "?村陽太,悪七泰樹,周藤悠介,菅原聡","電界誘起によるスピン伝導の加速を用いた非局所スピンデバイス","第 19 回半導体スピン工学の基礎と応用 PASPS-19",,," O-6",,,2014,Dec. "悪七泰樹,?村陽太,周藤悠介,菅原聡","スピン蓄積デバイスにおける Hanle 効果の解析","第 19 回半導体スピン工学の基礎と応用 PASPS-19",,," P-19",,,2014,Dec. "川目悠,悪七泰樹,?村陽太,周藤悠介,菅原聡","(100)配向したCo2FeSi0.5Al0.5/MgO/Siトンネル接合の作製とそのスピン注入源応用","第 19 回半導体スピン工学の基礎と応用 PASPS-19",,," P-20",,,2014,Dec. "Y. Takamura,T. Akushichi,Y. Shuto,S. Sugahara","Analysis and design of nonlocal spin devices with bias-induced spin-transport acceleration","59th Annual Magnetism & Magnetic Materials Conference",,," GS-07",,,2014,Nov. "Y. Kawame,Y. Shuto,K. Takahashi,T. Akushichi,Y. Takamura,S. Sugahara","Fabrication of a CoFe/TiO2/Si tunnel contact and its spin-injector application","59th Annual Magnetism & Magnetic Materials Conference",,," FW-15",,,2014,Nov. "Y. Kawame,T. Akushichi,Y. Shuto,Y. Takamura,S. Sugahara","Fabrication and characterization of spin injector using a high-quality B2-ordered-Co2FeSi0.5Al0.5 /MgO/Si tunnel contact","59th Annual Magnetism & Magnetic Materials Conference",,," AH-09",,,2014,Nov. "T. Akushichi,Y. Takamura,Y. Shuto,S. Sugahara","Spin accumulation in Si channels using CoFe/MgO/Si and CoFe/AlOx/Si tunnel contacts with the high quality tunnel barriers prepared by radical-oxygen annealing","59th Annual Magnetism & Magnetic Materials Conference",,," FW-11",,,2014,Nov. "高村陽太,悪七泰樹,周藤悠介,菅原聡","3端子スピン蓄積デバイスにおけるHanle効果信号の解析","第38回 日本磁気学会学術講演会","第38回 日本磁気学会学術講演会",," 4aD-1",,,2014,Sept. "高橋克典,悪七泰樹,周藤悠介,高村陽太,菅原聡","CoFe/TiO2/Siトンネルコンタクトの作製とそのスピン注入源への応用","第38回 日本磁気学会学術講演会",,," 4aD-4",,,2014,Sept. "川目悠,悪七泰樹,周藤悠介,高村陽太,菅原聡","B2型Co2FeSi0.5Al0.5/MgO/Siスピン注入源の作製と評価","第38回 日本磁気学会学術講演会",,," 4aD-3",,,2014,Sept. "悪七泰樹,高村陽太,周藤悠介,菅原聡","ラジカル酸素アニールによる高品質トンネル障壁を有するCoFe/MgO/SiおよびCoFe/AlOx/Siコンタクトを用いたスピン蓄積の評価","第38回 日本磁気学会学術講演会",,," 4aD-2",,,2014,Sept. "Y. Takamura,T. Akushichi,A. Sadono,T. Okishio,Y. Shuto,S. Sugahara","Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices",,"J. Appl. Phys.","AIP Publishing LLC.","vol. 115","no. 17","pp. 17C307/1-3",2014,Apr. "Y. Takamura,A. Sadono,T. Akushichi,T. Okishio,Y. Shuto,S. Sugahara","Analysis of Hanle-effect signals observed in a Si-channel spin accumulation device with a high-quality CoFe/MgO/Si spin injector","The 61st JSAP Spring Meeting, 2014",,,,,,2014,Mar. "Y. Takamura,A. Sadono,T. Akushichi,T. Okishio,Y. Shuto,S. Sugahara","Analysis of Hanle-effect signals observed in Si-channel spin accumulation devices","The 58th Annual Magnetism and Magnetic Materials (MMM) Conference",,,,," AX-05",2013,Nov.