"Ahmet Parhat,Wataru Hosoda,unknown unknown,Yoshihisa Ohishi,Kuniyuki KAKUSHIMA,KAZUO TSUTSUI,HIROSHI IWAI","Er Inserted Ni Silicide Metal Source/Drain for Schottky MOSFETs","IEEE IWJT 2010 Extended Abstracts 2010 International Workshop on Junction Technology",,,,,,2010,May
"K. Tsutsui,T. Shiozawa,K. Nagahiro,Y. Ohishi,K. Kakushima,P. Ahmet,N. Urushihara,M. Suzuki,H. Iwai","Effects of B or Al Interface Layers on Thermal Stability of Ni Silicide on Si","213th ECS Meeting",,,,,,2008,May
"–μŒϋ_•½,‘εΞ‘P‹v,Šp“ˆ–M”V,ƒp[ƒ‹ƒnƒbƒgƒAƒwƒƒg,“›ˆδˆκΆ,™ˆδM”V,•ž•”Œ’—Y,Šβˆδ—m","Er‘wŠE–Κ‘}“ό‚Ι‚ζ‚ιNiƒVƒŠƒTƒCƒh‚ΜƒVƒ‡ƒbƒgƒL[α•Η•Ο’²‹Zp","t‹G‘ζ55‰ρ‰ž—p•¨—Šw‰οŠwpu‰‰‰ο","t‹G‘ζ55‰ρ‰ž—p•¨—Šw‰οŠwpu‰‰‰ο—\eW","‰ž—p•¨—Šw‰ο",,"No. 2","pp. 879",2008,Mar.