"Eisuke Tokumitsu,Kojiro Okamoto,Hiroshi Ishiwara","Low Voltage Operation of Nonvolatile Metal-Ferroelectric-Metal-Insulator-Semiconductor(MFMIS)-Field-Effect-Transistors(FETs) Using Pt/SrBi<sub>2</sub>Ta<sub>2</sub>O<sub>9</sub>/Pt/SrTa<sub>2</sub>O<sub>6</sub>/SiON/Si Structures",,"Jpn. J. Appl. Phys.",,"Vol. 40","No. 4B","pp. 2917-2922",2001,Apr.
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