"Takashi Kojima,Junichi Kimura,Muneyasu Suzuki,Kenji Takahashi,Takahiro Oikawa,Yukio Sakashita,Kazumi Kato,Takayuki Watanabe,Tadashi Takenaka,Tomoaki Yamada,Hiroshi Funakubo","Anisotropic electrical properties in bismuth layer structured dielectrics with natural super lattice structure",,"Appl. Phys. Lett.",,"Vol. 101",,"pp. 012907-1-4",2012,
"Shinichi Ito,Tomoaki Yamada,Kenji Takahashi,Shoji Okamoto,Takafumi Kamo,Hiroshi Funakubo,Ivoyl Koutsaroff,Marina Zelner,Andrew Cervin-Lawry","Effect of bottom electrode on dielectric property of sputtered-(Ba,Sr) TiO3 films",,"J.Appl.Phys.",,"Vol. 105",,"pp. 061606-1-4",2009,
"HIROSHI FUNAKUBO,Muneyasu Suzuki,Kenji Takahashi,Takayuki Watanabe","gTemperature Dependency of Dielectric Properties in Epitaxially Grown SrBi4Ti4O15 Films with Different Orientationh",,"Key Engineering Materials",,"Vol. 368-372",,"pp. 1811-1813",2008,
"Hiroshi Funakubo,Kenji Takahashi,Muneyasu Suzuki,Takashi Kojima,Takayuki Watanabe,Kazumi Kato,Yukio Sakashita,Kazushi Sumitani,Osami Sakata","gDegradation Free Characteristics of c-axis Oriented Bismuth Layer-Structured Dielectricsh","International Symposium on Integrated Ferroelectrics (ISIF 2007)",,,"Vol. 4A-70-I",,"p. 30",2007,May
"Naoki OHASHI,Kenji Takahashi,Shunichi Hishita,Isao Sakaguchi,HIROSHI FUNAKUBO,Hajime Haneda","Fabrication of ZnO Microstructures by AnisotropicWet-Chemical Etching",,"Journal of The Electrochemical Society",,"Vol. 154","No. 2","pp. D82-D87",2007,
"Joe Sakai,Nobuaki Ito,ShinIchi Ito,Kenji Takahashi,Hiroshi Funakubo","gOxygen Content and Magnetic Properties of SrRuO3-ƒÂ Thin Filmsh",,"IEEE Transactions on Magnetics,",,"Vol. 43","No. 6","pp. 3073-3075.",2007,
"Joe Sakai,Nobuaki Ito,Shinichi Ito,Kenji Takahashi,HIROSHI FUNAKUBO","gEffect of thermal treatment on oxygen stoichiometry and transport properties of SrRuO3 thin filmsh",,"Appl. Phys. Lett.",,"Vol. 89",,"pp. 242115",2006,
"Shiro Hino,Makoto Nakayama,Kenji Takahashi,Hiroshi Funakubo,Eisuke Tokumitsu","Characterization of Hafnium Oxide Thin Films by Sorce Gas Pulse Introduced Metalorganic Chemical Vapor Deposition using Amino-Family Hf Precursors",,"Jpn. J. Appl. Phys.",,"Vol. 42, Part 1","No. 9B","pp. 6015-6018",2003,Sept.
"Kenji Takahashi,Makoto Nakayama,Shiro Hino,Eisuke Tokumitsu,Hiroshi Funakubo","Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties",,"Integrated Ferroelectrics",,"vol. 57",,"pp. 1185-1192",2003,Mar.
"Kenji Takahashi,Makoto Nakayama,Shintaro Yokoyama,Takeshi Kimura,Eisuke Tokumitsu","Preparation of hafnium oxide films from oxygen-free Hf[N(C2H5)2]4 precursor and their properties",,"Applied Surface Science",,,"No. 216","pp. 296-301",2003,Jan.