"E. Tokumitsu,D. Takahashi,H. Ishiwara","Characterization of Metal-Ferroelectric- (Metal-)Insulator-Semiconductor(MF(M)IS)Structures Using (Pb,La)(Zr,Ti)O<sub>3</sub>and Y<sub>2</sub>O<sub>3</sub> Films",,"Jpn. J. Appl. Phys.",,"Vol. 39","No. 9B","pp. 5456-5459",2000,Sept.