"Katsunobu Nishihara,Kazumi Fujima,Hiroyuki Furukawa,K.Gamada,T.Kagawa,Y-G.Kang,T.Kato,Tohru Kawamura,Fumihiro Koike,R.More,H. Maehara,M.Murakami,Takeshi Nishikawa,A.Sasaki,A.Sunahara,H.Tanuma,V.Zhakhovskii,Shinsuke Fujioka,Hiroaki Nishimura,Yoshinori Shimada,S.Uchida,N.Miyanaga,Y.Izawa","Theoretical Modeling and Optimization of LPP EUV Light Source","3rd International Extreme UltraViolet Lithography Symposium, Miyazaki, Japan, 1-4 November, 2004.","4th International Extreme UltraViolet Lithography (EUVL) Symposium, San Diego, California, USA, 07-09 November, 2005.",,"Vol. http://www.sematech.org/",,,2005,Nov.