"•�“c �‚Žu,�¬–ì —½,‘�ŠÔ —D‘¾,Žë–ì ŠG”ü,�@“c ˆÉ—�–ç,Žá—Ñ �®,ŒÜ�\—’ �M�s","ƒXƒpƒbƒ^�¬–ŒMoS2‚ÌŠî”Â�ã‚Å‚ÌŒ´Žq•ª‰ð”\“dŽqŒ°”÷‹¾ŠÏŽ@","‘æ84‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2023,Sept.
"Ryo Ono,Shinya Imai,Yuta Kusama,Takuya Hamada,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Emi Kano,Nobuyuki Ikarashi,Hitoshi Wakabayash","Elucidation of PVD MoS2 Film Formation Process and its Structure Focusing on Sub-Monolayer Region",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61",,,2022,Feb.
"J. Shimizu,T. Ohashi,K. Matsuura,I. Muneta,K. Kakushima,K. Tsutsui,N. Ikarashi,H. Wakabayashi,N. Ikarashi","Low-Temperature MoS2 Film Formation using Sputtering and H2S Annealing",,"Journal of the Electron Devices Society",,"Vol. 7","No. 1","p. 2",2018,Oct.
"T. Sakamoto,T. Ohashi,K. Matsuura,I. Muneta,K. Kakushima,K. Tsutsui,Y. Suzuki,N. Ikarashi,H. Wakabayashi","Mechanism for High Hall-Effect Mobility in Sputtered-MoS2 Film Controlling Particle Energy","IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)",,,,,,2018,Oct.