"小山将央,M. Casse,R. Coquand,S. Barraud,G. Ghibaudo,HIROSHI IWAI,G. Reimbold","Influence of Technological and Geometrical Parameters on Low-frequency Noise in SOI Omega-gate Nanowire MOSFETs","2014 International Symposium on VLSI Technology, Systems and Applications(2014 VLSI-TSA)",,,,,,2014,
"小山将央,M. Casse,S. Barraud,G. Ghibaudo,HIROSHI IWAI,G. Reimbold","Assessment of Technological Device Parameters by Low-frequency Noise Investigation in SOI Omega-gate Nanowire NMOS FETs","15th ULIS Conference, April 9, 2014, ,",,,,,,2014,
"小山将央,M. Casse,R. Coquand,S. Barraud,C. Vizioz,C. Comboroure,P. Perreau,V. Maffini-Alvaro,C. Tabone,,L. Tosti,S. Barnola,V. Delaye,F. Aussenac,G. Ghibaudo,HIROSHI IWAI,G. Reimbold","Study of carrier transport in strained and unstrained SOI tri-gate and omega-gate silicon nanowire MOSFETs",,"Solid-State Electronics",,"Vol. 84",,"pp. 46-52",2013,June
"Kazuki Matsumoto,小山将央,Y. Wu,Kuniyuki KAKUSHIMA,パールハットアヘメト,片岡好則,Akira Nishiyama,Nobuyuki Sugii,KAZUO TSUTSUI,Kenji Natori,takeo hattori,HIROSHI IWAI","Size dependent resistivity change of Ni-silicides in nano-region","Workshop and IEEE EDS Mini-colloquium on Nanometer CMOS Technology (WIMNACT 37)",,,,,,2013,
"小山将央,Naoto Shigemori,Kenji Ozawa,Kiichi Tachi,Kuniyuki KAKUSHIMA,O. Nakatsuka,大毛利健治,KAZUO TSUTSUI,西山彰,Nobuyuki Sugii,Keisaku Yamada,HIROSHI IWAI","Si/Ni-Silicide Schottky Junctions with Atomically Flat Interfaces Using NiSi2 Source","41st European Solid-State Device Research Conference",,,,,,2013,
"Kazuki Matsumoto,小山将央,Kuniyuki KAKUSHIMA,パールハットアヘメト,Akira Nishiyama,杉井信之,KAZUO TSUTSUI,Kenji Natori,takeo hattori,HIROSHI IWAI","Ni silicidation for Si fin and nanowire structures","G-COE PICE International Symposium and IEEE EDS Minicolloquium on Advanced Hybrid Nano Devices: Prospects by World’s Leading Scientists",,,,,,2013,
"宋  ?漢,小山将央,Kazuki Matsumoto,Kuniyuki KAKUSHIMA,中塚理,大毛利健治,KAZUO TSUTSUI,Akira Nishiyama,Nobuyuki Sugii,Keisaku Yamada,HIROSHI IWAI","Atomically flat Ni-silicide/Si interface using NiSi2 sputtering","Workshop and IEEE EDS Mini-colloquium on Nanometer CMOS Technology (WIMNACT 37)",,,,,,2013,
"Kazuki Matsumoto,小山将央,Y. Wu,Kuniyuki KAKUSHIMA,パールハットアヘメト,片岡好則,Akira Nishiyama,Nobuyuki Sugii,KAZUO TSUTSUI,Kenji Natori,takeo hattori,HIROSHI IWAI","Electrical Analyses of Nickel Silicide Formed on Si Nanowires with 10-nm-width","International Symposium on Next-Generation Electronics(ISNE 2013)",,,,,,2013,
"M. Casse,S. Barraud,R. Coquand,小山将央,D. Cooper,C. Vizioz,C. Comboroure,P. Perreau,V. Maffini-Alvaro,C. Tabone,L. Tosti,S. Barnola,V. Delaye,F. Aussenac,G. Ghibaudo,HIROSHI IWAI,G. Reimbold","Strain-Enhanced Performance of Si-Nanowire FETs","ECS 223nd Meeting","ECS Transactions",,"Vol. 53","No. 3","pp. 125-136",2013,
"小山将央,M. Casse,R. Coquand,S. Barraud,G. Ghibaudo,HIROSHI IWAI,G. Reimbold","Study of Low-frequency Noise in SOI Tri-gate Silicon Nanowire MOSFETs","22nd ICNF",,,,,,2013,
"小山将央,M. Casse,R. Coquand,S. Barraud,G. Ghibaudo,HIROSHI IWAI,G. Reimbold","Influence of Device Scaling on Low-frequency Noise in SOI Tri-gate Si Nanowire N-and PMOS FETs","ESSDERC 2013",,,,,,2013,
"Kazuki Matsumoto,小山将央,Y. Wu,Kuniyuki KAKUSHIMA,パールハットアヘメト,KAZUO TSUTSUI,Akira Nishiyama,Nobuyuki Sugii,Kenji Natori,takeo hattori,HIROSHI IWAI","Ni silicidation for Si Fin and nanowire strucures","IEEE EDS MQ WIMNACT 32 C0-sponsored by EDS Japan Chapter and TIT",,,,,,2012,
"Kazuki Matsumoto,小山将央,Y. Wu,Kuniyuki KAKUSHIMA,パールハットアヘメト,KAZUO TSUTSUI,Akira Nishiyama,Nobuyuki Sugii,Kenji Natori,takeo hattori,HIROSHI IWAI","Ni silicidation for Si Fin and nanowire strucures","IEEE EDS MQ WIMNACT 32 C0-sponsored by EDS Japan Chapter and TIT",,,,,,2012,
"小山将央,M. Casse,R. Coquand,S. Barraud,HIROSHI IWAI,G. Ghibaudo,G. Reimbold","Study of Carrier Transport in Strained and Unstrained SOI Tri-gate and Omega-gate Si Nanowire MOSFETs","ESSDERC 2012",,,,,,2012,
"松本一輝,小山将央,呉研,角嶋邦之,パールハットアヘメト,筒井一生,西山彰,杉井信之,名取研二,服部健雄,岩井洋","酸化膜被覆型SiナノワイヤおよびSi Fin構造におけるNiシリサイド成長機構の検討","第72回応用物理学会学術講演会",,,,,,2011,
"小山将央,Naoto Shigemori,Hideaki Arai,Soshi Sato,Kuniyuki KAKUSHIMA,Ahmet Parhat,KAZUO TSUTSUI,西山彰,Nobuyuki Sugii,KENJI NATORI,takeo hattori,HIROSHI IWAI","Lateral encroachment of Ni silicide into silicon nanowire","Taiwan-Japan Workshop on “Nano Devices”",,,,,,2011,
"小山 将央,茂森直登,佐藤創志,角嶋邦之,パールハットアヘメト,西山彰,筒井一生,杉井信之,名取研二,服部健雄,岩井洋","窒素導入によるSiナノワイヤ内へのNiシリサイド侵入抑制機構の検討","第７１回応用物理学会学術講演会",,,,,,2010,Sept.
"小山将央,茂森直登,新井英朗,佐藤創志,角嶋邦之,パールハットアヘメト,筒井一生,西山彰,杉井信之,名取研二,服部健雄,岩井洋","Lateral encroachment of Ni silicide into Si nanowire","複合創造領域シンポジウム",,,,,,2010,