"Takashi Ito,Ichiro Kato,Takao Nozak,Tetsuo Nakamura,Hajime Ishikawa","Plasma enhanced Thermal Nitridation of Silicon",,"Applied Phisics Letters","American Institute of Physics","Vol. 38","No. 5","pp. 370-372",1981,
"Takashi Ito,Takao Nozaki,Hajime Ishikawa,Yukio Fukukawa","Thermal Nitride Gate FET Technology for VLSI Devices","ISSCC Dig. of Tech. Papers","ISSCC Dig. of Tech. Papers",,,,"pp. 73-74",1980,
"Takashi Ito,Takao Nozaki,Hajime Ishikawa","Direct Thermal Nitridation of Silicon Dioxide Films in Ammonia Gas",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 127","No. 9","pp. 2053-2057",1980,
"Takashi Ito,Hideki Arakawa,Takao Nozaki,Hajime Ishikawa","Retardation of Destructive Breakdown of SiO2 Films Annealed in Ammonia Gas",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 127","No. 10","pp. 2248-2251",1980,
"Takashi Ito,Shinpei Hijiya,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda,Yukio Fukukawa","Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 125","No. 3","pp. 448-452",1979,
"Takashi Ito,Shinpei Hijiya,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda","Low Voltage Alterable EAROM Cells with Nitride-Barrier Avalanche Injection MIS(NAMIS)",,"IEEE TRANSACTIONS ON ELECTRON DEVICES","IEEE Electron Devices Society","Vol. ED-26","No. 6","pp. 906-913",1979,
"Takashi Ito,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda","Thermally Grown Silicon Nitride Films for High Performance MNS Devices",,"Applied Phisics Letters","American Institute of Physics","Vol. 32","No. 5","pp. 330-331",1978,
"Takashi Ito,Takao Nozaki,Hideki Arakawa,Shinpei Hijiya,Masaichi Shinoda,Yukio Fukukawa","Thermally Nitrided Silicon Films By Direct Reaction","Abs. of 150th ECS Fall Meeting","Abs. of 150th ECS Fall Meeting",,,,"p. 310",1976,