"Takashi Ito,Hajime Ishikawa,Yukio Fukukawa","Thermal Nitridation of Silicon in Advanced LSI Processing",,"Japanese Journal of Applied Physics. Supplement","The Japan Society of Applied Phisics","Vol. 20-1",,"pp. 33-38",1980,
"Takashi Ito,Takao Nozaki,Hajime Ishikawa,Yukio Fukukawa","Thermal Nitride Gate FET Technology for VLSI Devices","ISSCC Dig. of Tech. Papers","ISSCC Dig. of Tech. Papers",,,,"pp. 73-74",1980,
"Takashi Ito,Hajime Ishikawa,Yukio Fukukawa","Thermal Nitridation of Silicon in Advanced LSI Processing","Ext. Abs. on 12th Conf. on SSDM","Ext. Abs. on 12th Conf. on SSDM",,,,"pp. 9-10",1980,
"Takashi Ito,Shinpei Hijiya,Takao Nozaki,Hideki Arakawa,Masaichi Shinoda,Yukio Fukukawa","Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen",,"Journal of The Electrochemical Society","The Electrochemical Society","Vol. 125","No. 3","pp. 448-452",1979,
"Takashi Ito,Takao Nozaki,Hideki Arakawa,Shinpei Hijiya,Masaichi Shinoda,Yukio Fukukawa","Thermally Nitrided Silicon Films By Direct Reaction","Abs. of 150th ECS Fall Meeting","Abs. of 150th ECS Fall Meeting",,,,"p. 310",1976,