"Takayuki Aoyama,Kunihiro Suzuki,Hiroko Tashiro,Yoko Toda,Tatsuya Yamazaki,Kanetake Takasaki,Takashi Ito","Effect of Fluorine on Boron Diffusion in Thin Silicon Dioxides and Oxynitride",,"Journal of Applied Physics","American Institute of Physics","Vol. 77","No. 1","pp. 417-419",1994,Sept.