"H.D. Trinh,Yueh-Chin Lin,H.C. Wang,C.H. Chang,Kuniyuki KAKUSHIMA,HIROSHI IWAI,Takamasa Kawanago,Y.G. Lin,C.M. Chen,Y.Y.Wong,G.N. Huang,M. Hudait,E.Y. Chang","Effect of Postdeposition, Annealing Temperatures on Electrical Characteristics of Molecular-Beam-Deposited HfO2 on n-InAs/InGaAs Metal-Oxide-Semiconductor Capacitors",,"Applied Physics Express",,"Vol. 5","No. 2","pp. .021104-1-3",2012,Feb.