"�¡•Ê•{�G�s,‘哇�F�m,•ž•”�^ˆË,’†’J  “¹�l,�{ŽR •q�®,‹g�¼ Œö•½,‘å—F –¾","—§•û�»Mg<sub>x</sub> Zn<sub>1�|x</sub> O �¬�»”––Œ‚¨‚æ‚Ñ’´ŠiŽq�\‘¢‚Ì�[Ž‡ŠOCL ”­Œõ“Á�«","‘æ77‰ñ‰ž—p•¨—�Šw‰ï�t‹GŠw�p�u‰‰‰ï",,,,,,2016,Sept.
"Œüˆä �Í,‘哇 �F�m,‹g�¼ Œö•½,“¡ˆä �r•ã,�{ŽR •q�®,‘å—F –¾","LaGaO<sub>3</sub>ƒGƒsƒ^ƒLƒVƒƒƒ‹”––Œ‚Ì�¬’·‚Æ�[Ž‡ŠOƒJƒ\�[ƒhƒ‹ƒ~ƒlƒbƒZƒ“ƒX“Á�«•]‰¿","‘æ75‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2014,Sept.
"M. Niwa,A. Mukai,T. Oshima,T. Nagami,T. Suyama,A. Ohtomo","Epitaxial growth of ZnGa<sub>2</sub>O<sub>4</sub> films by mist chemical vapor deposition","The Eighth International Conference on the Science and Technology for Advanced Ceramics",,,,,,2014,June
"T. Oshima,M. Niwa,A. Mukai,T. Nagami,T. Suyama,A. Ohtomo","Epitaxial growth of wide-band-gap ZnGa<sub>2</sub>O<sub>4</sub> films","The 41th International Symposium on Compound Semiconductor",,,,,,2014,May
"T. Oshima,M. Niwa,A. Mukai,T. Nagami,T. Suyama,A. Ohtomo","Epitaxial growth of wide-band-gap ZnGa<sub>2</sub>O<sub>4</sub> films by mist chemical vapor deposition",,"Journal of Crystal Growth","Elsevier","Volume 386",,"Page 190-193",2014,Jan.
"’O‰H ŽO“~,Œüˆä �Í,‘哇 �F�m,’·Œ© ’mŽj,�{ŽR •q�®,‘å—F –¾","ƒ~ƒXƒgCVD–@‚É‚æ‚éZnGa<sub>2</sub>O<sub>4</sub>”––Œ‚̃Gƒsƒ^ƒLƒVƒƒƒ‹�¬’·","‘æ74‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2013,Sept.