"K. Tuokedaerhan,Shuhei Hosoda,Yoshinori Nakamura,Kuniyuki KAKUSHIMA,ЉD,R,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","Influence of Carbon Incorporation in W Gate Electrode for La-silicate Gate Dielectrics","2013 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES-SCINCE AND TECHNOLOGY",,,,,,2014,