"M. Shimura,T. Shirasawa,R. Ushioda,K. Nakatsuji,H. Hirayama","Growth kinetics of a perfectly flat Bi(110) film during low-temperature deposition and subsequent annealing",,"Surface Science",,"Volume 728",,"  122210",2023,Feb.
"‰œŽR—T–,S. V. Eremeev,”’āV“O˜Y,™ŽR—T–í,Šp“cˆęŽũ,‹{–{KŽĄ,‰œ“c‘ūˆę,o“c^ˆę˜Y,“c’†īŪ,E. V. Chulkov,•―Œī“O","ƒgƒ|ƒƒWƒJƒ‹â‰‘Ė/ŽĨŦâ‰‘Ė’ī”––ŒƒwƒeƒÚ‡ IFŒ‹ŧ\‘Ē‚Æ“dŽqó‘Ô","“ú–{•Ļ—Šw‰ï ‘æ72‰ņ”NŽŸ‘å‰ï",,,,,,2017,Mar.