"Cheol-hyun Lim,”¼“߃ˆê","GeF4-Si2H6Œn‚ð—p‚¢‚é”MCVD‚ð—p‚¢‚½Ge’PŒ‹»–Œ‚ÌŒ`¬","‘æ70‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï","‘æ70‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ïu‰‰—\eW",,,,,2010,July "Jun-ichi Hanna,Cheol-hyun Lim","Deposition of Poly-SiGe Thin Films by Reactive Thermal CVD and Their TFT Applications","MRS Spring Meeting 2010","Proceedings of MRS Spring Meeting 2010",,,,,2010,Apr. "Jun-ichi Hanna,Cheol hyun Lim","Low-temperature Growt of epi-Ge thin films by reactive Thermal CVD","2nd Int. Symposium on Innovative Solar Cells","Proceedings of 2nd Int. Symposium on Innovative Solar Cells",,,,,2009,Dec. "Cheol-hyun Lim,Tatsuya Hoshino,Jun-ichi Hanna","Direct deposition technique for poly-SiGe thin film achieving a mobility exceeding 20 cm2/Vs with ~30 nm thick bottom-gate TFTs","IMID 2009","IMID 2009 Digest",,,,,2009,Oct. "Cheol-hyun.Lim,Jeong-Woo Lee,Jun-ichi. Hanna","Deposition of Device grade poly-Si films on glasssubstrate directly at 450oC and fabrication of bottom-gate poly-Si TFTs",,,,,,,2009,July "Cheol hyun Lim,Jun-ichi Hanna","Fabrication and characterization of new low-temperature siliconoxide thin film using Tetra-iso-propoxysilane",,"‘æ69‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï—\eW",,,,,2008,Sept. "Cheol-hyun Lim,Jeong-Woo Lee,Jun-ichi Hanna","CVD-Produced Polycrystalline Silicon Thin Film Prepared by Fluorine-Mediated Crystal Growth on a Glass Substrate and its Thin Film Transistor Application",,"Chem. Vapor. Depo.",,"Vol. 14","No. 5-6","pp. 107-110",2008,July "Jeong-Woo Lee,Cheol hyun Lim,Jun-ichi Hanna","Deposition of device grade poly-Si films on glass substrate directly at 450 ‹C and fabrication of bottom-gate poly-Si TFTs",,"Journal of Non-Crystalline Solids",,"Vol. 354","No. 18-25","pp. 2500-2504",2008,June "N. Sasaki,. Lim, J,. Hanna","Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD",,"J. Non-Cryst. Solids",,"Vol. 354",,"p. 2079",2008,Feb. "N. Sasaki,C. Lim,J. Hanna","Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD","22nd International Conference on Amorphous and Nanocrystalline Semiconducto",,,,,,2007,Aug. "Cheol-hyun Lim,Jun-ichi Hanna","Improvement ofin electrical characteristics of Plasma enhanced Chemical Vapor Deposition?teraethoxylsilane?SiO2 by atomic hydrogen passivation via hot-wire technique",,"Jpn. J. Appl. Phys.",,"Vol. 45","No. 48","pp. L1270-1272",2006,July