"Takuya Hamada,Masaya Hamada,Satoshi Igarashi,Taiga Horiguchi,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","WS2 Film by Sputtering and Sulfur-Vapor Annealing, and its pMISFET with TiN/HfO2 Top-Gate Stack, TiN Bottom Contact, and Ultra-Thin Body and Box",,"Journal of the Electron Devices Society (J-EDS)",,"Vol. 9",,"p. 1117",2021,Aug.
"Satoshi Igarashi,Yusuke Mochiduki,Haruki Tanigawa,Masaya Hamada,Kentaro Matsuura,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Self-Aligned-TiSi2 Bottom Contact with APM Cleaning and Post-annealing for Sputtered-MoS2 Film",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBH04",2021,Jan.
"Satoshi Igarashi,Yusuke Mochiduki,Haruki Tanigawa,Masaya Hamada,Kentaro Matsuura,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Low Contact Resistance at Interface between Sputtered-MoS2 Film and TiSi2 Contact Treated by Higher-Temperature Forming-Gas Annealing","International Conference of Solid State Devices and Materials (SSDM) 2020",,,,,,2020,Sept.
"五十嵐 智,望月 祐輔,谷川 晴紀,濱田 昌也,松浦 賢太朗,角嶋 邦之,筒井 一生,若林 整","スパッタMoS2膜とTiSi2膜の界面におけるFGアニールによるコンタクト抵抗低減","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"今井 慎也,濱田 昌也,五十嵐 智,宗田 伊理也,角嶋 邦之,筒井 一生,若林 整","硫化プロセスにおけるスパッタMoS2膜質向上の重要性","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"五十嵐 智,松浦 賢太朗,濱田 昌也,谷川 晴紀,坂本 拓朗,宗田 伊理也,角嶋 邦之,筒井 一生,若林 整","保護膜を通したフォーミングガスアニールによるスパッタMoS2 膜の結晶性改善","第79回応用物理学会秋季学術講演会",,,,,,2018,Sept.