@article{CTT100890872,
  author = {Takanori Mimura and Yuki Tashiro and Takao Shimizu and Hiroshi Funakubo},
  title = {Systematic Investigation of Ferroelectric Properties in x%YO1.5-(100-x%)Hf1-yZryO2 Films},
  journal = {ACS Appl. Electron. Mater.},
  year = 2023,
}

@article{CTT100863342,
  author = {Yuki Tashiro and Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Comprehensive study on the kinetic formation of the orthorhombic ferroelectric phase in epitaxial Y-doped ferroelectric HfO2 thin films},
  journal = {ACS Applied Electronic Materials 2021},
  year = 2021,
}

@article{CTT100863341,
  author = {Yuki Tashiro and Takao Shimizu and Takanori Mimura and Hiroshi Funakubo},
  title = {Comprehensive study on the kinetic formation of the orthorhombic ferroelectric phase in epitaxial Y-doped ferroelectric HfO2 thin films},
  journal = {ACS Applied Electronic Materials 2021},
  year = 2021,
}

@article{CTT100852833,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko J. Konnno and Osami Sakata and Hiroshi Funakubo},
  title = {Electric-field-induced ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2: Transformation from the paraelectric tetragonal phase to the ferroelectric orthorhombic phase},
  journal = {Physica Status Solidi},
  year = 2021,
}

@inproceedings{CTT100903079,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Hiroshi Funakubo},
  title = {Kinetic formation and field induced phase transition in ferroelectric HfO2- based materials},
  booktitle = {},
  year = 2022,
}

@inproceedings{CTT100874651,
  author = {Takao Shimizu and Yuki Tashiro and Takanori Mimura and Hiroshi Funakubo},
  title = {Ferroelectricity induced by the kinetic formation in Y-HfO2 epitaxial films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867241,
  author = {Shimizu, T. and Tashiro Y. and Takanori M. and Shiraishi T. and Kiguchi T. and Konno T. J. and Sakata O. and Funakubo H.},
  title = {Field-Induced Structural Change in HfO2-Based Ferroelectric Materials},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100867226,
  author = {清水荘雄 and 田代裕貴 and 三村和仙 and 舟窪浩},
  title = {Y-置換HfO2基材料の強誘電性の発現},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865040,
  author = {Hiroshi Funakubo and Yuki Tashiro and Takanori Mimura and Takao Shimizu},
  title = {Phase stability of ferroelectric HfO2-based films},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865385,
  author = {Takao Shimizu and Takanori Mimura and Yuki Tashiro and Takanori Kiguchi and Takahisa Shiraishi and Toyohiko J. Konno and Osami Sakata and Hiroshi Funakubo},
  title = {Field-induced structural change in HfO2-based ferroelectric materials},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865540,
  author = {Shimizu, T. and Mimura, T. and Tashiro, Y. and Sakata, O. and Funakubo, H},
  title = {Phase transition in HfO2 ferroelectric materials investigated by XRD study},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100865379,
  author = {Takao Shimizu and Takanori Mimura and Yuki Tashiro and Takahisa Shiraishi and Takanori Kiguchi and Toyohiko J. Konno and Osami Sakata and Yoshio Katsuya and Hiroshi Funakubo},
  title = {Structure Change in the HfO2 Ferroelectric Materials Induced by an Electric Field},
  booktitle = {},
  year = 2021,
}

@inproceedings{CTT100853267,
  author = {清水荘雄 and 田代裕貴 and 三村和仙 and 舟窪浩},
  title = {HfO2基材料における強誘電相生成機構},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821813,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 勝矢良雄 and 坂田修身 and 木口賢紀 and 白石貴久 and 今野豊彦 and 舟窪浩},
  title = {HfO2基薄膜のZr, Yドープによる結晶相変化と強誘電相の安定性},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821753,
  author = {Yu-ki Tashiro and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Preparation and Characterization of Y, Zr-doped HfO2 Thin Film by PLD Method},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821731,
  author = {Yu-ki Tashiro and Takanori Mimura and Takao Shimizu and Hiroshi Funakubo},
  title = {Preparation and characterization of Y, Zr-doped HfO2 thin films by PLD method},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100821728,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 勝矢良雄 and 坂田修身 and 木口賢紀 and 白石貴久 and 今野豊彦 and 舟窪浩},
  title = {HfO2基薄膜の電界誘起相転移},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806479,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {PLD法を用いたY, ZrドープHfO2薄膜の作製と評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100806461,
  author = {田代裕貴 and 三村和仙 and 清水荘雄 and 舟窪浩},
  title = {PLD法を用いたY, ZrドープHfO2薄膜の作製と評価},
  booktitle = {},
  year = 2019,
}