@article{CTT100640880, author = {Y. Takamura and K. Hayashi and Y. Shuto and R. Nakane and S. Sugahara}, title = {Fabrication of High-Quality Co2FeSi/SiOxNy/Si(100) Tunnel Contacts Using Radical-Oxynitridation-Formed SiOxNy Barrier for Si-Based Spin Transistors}, journal = {J. Electron. Mater.}, year = 2012, } @article{CTT100619518, author = {K. Hayashi and Y. Takamura and R. Nakane and S. Sugahara}, title = {Formation of Co2FeSi/SiOxNy/Si tunnel junctions for Si-based spin transistors}, journal = {J. Appl. Phys.}, year = 2010, } @inproceedings{CTT100640966, author = {高村陽太 and 林建吾 and 影井泰次郎 and 周藤悠介 and 菅原聡}, title = {ラジカル酸窒化膜を用いたCFS/SiOxNy/Siトンネル接合の形成と構造評価}, booktitle = {}, year = 2011, } @inproceedings{CTT100640908, author = {Y. Takamura and K. Hayashi and Y. Shuto and S. Sugahara}, title = {Formation and structural analysis of half-metallic Co2FeSi/SiOxNy/Si contacts with radical-oxynitridation-SiOxNy tunnel barrier}, booktitle = {}, year = 2011, } @inproceedings{CTT100627851, author = {髙村 陽太 and 林 建吾 and 周藤 悠介 and 菅原 聡}, title = {ラジカル酸窒化法を用いたCo2FeSi/SiOxNy/Siトンネル接合の形成}, booktitle = {}, year = 2011, } @inproceedings{CTT100640914, author = {Y. Takamura and K. Hayashi and Y. Shuto and S. Sugahara}, title = {Formation of half-metallic tunnel junctions of Co2FeSi/SiOxNy/Si using radical oxynitridation technique}, booktitle = {}, year = 2011, } @inproceedings{CTT100640977, author = {林建吾 and 高村陽太 and 周藤悠介 and 菅原聡}, title = {RTA法を用いたCo2FeSiの形成における初期多層膜構造の影響}, booktitle = {}, year = 2011, } @inproceedings{CTT100629978, author = {林建吾 and 高村陽太 and 中根了昌 and 菅原聡}, title = {Co2FeSi/SiOxNy/Siトンネル接合の形成とその構造評価}, booktitle = {}, year = 2010, } @inproceedings{CTT100605413, author = {K. Hayashi and Y. Takamura and R. Nakane and S. Sugahara}, title = {Preparation and characterization of full-Heusler Co2FeSi alloy thin films on amorphous insulator films}, booktitle = {}, year = 2009, } @inproceedings{CTT100583570, author = {林建吾 and 高村陽太 and 中根了昌 and 菅原聡}, title = {極薄絶縁膜上へのフルホイスラー合金Co2FeSiの形成とその評価}, booktitle = {}, year = 2009, } @inproceedings{CTT100583580, author = {林建吾 and 高村陽太 and 中根了昌 and 菅原聡}, title = {非晶質絶縁膜上へのフルホイスラー合金Co2FeSiの形成と評価}, booktitle = {}, year = 2009, }