@article{CTT100736763,
  author = {Ahmed Awad and Atsushi Takahashi and Satoshi Tanaka and Chikaaki Kodama},
  title = {A Fast Process-Variation-Aware Mask Optimization Algorithm With a Novel Intensity Modeling},
  journal = {IEEE Transactions on Very Large Scale Integration (VLSI) Systems},
  year = 2017,
}

@article{CTT100735891,
  author = {Ahmed Awad and Atsushi Takahashi and Satoshi Tanaka and Chikaaki Kodama},
  title = {Intensity Difference Map (IDM) Accuracy Analysis for OPC Efficiency Verification and Further Enhancement},
  journal = {IPSJ Trans. on System LSI Design Methodology},
  year = 2017,
}

@article{CTT100734589,
  author = {Ahmed Awad and Atsushi Takahashi and Chikaaki Kodama},
  title = {A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model},
  journal = {IEICE Trans. Fundamentals},
  year = 2016,
}

@inproceedings{CTT100705221,
  author = {Ahmed Awad and Atsushi Takahashi},
  title = {A Lithographic Mask Manufacturability and Pattern Fidelity Aware OPC Algorithm},
  booktitle = {Proc. International Symposium on VLSI Design, Automation and Test (VLSI-DAT 2016)},
  year = 2016,
}

@inproceedings{CTT100703818,
  author = {Ahmed Awad and Atsushi Takahashi and Chikaaki Kodama},
  title = {A Fast Manufacturability Aware Optical Proximity Correction (OPC) Algorithm with Adaptive Wafer Image Estimation},
  booktitle = {Proc.  Design, Automation and Test in Europe (DATE 2016)},
  year = 2016,
}

@inproceedings{CTT100697246,
  author = {Ahmed Awad and Atsushi Takahashi},
  title = {Mask Manufacturability Aware Post OPC Algorithm For Optical Lithography},
  booktitle = {Proc. DA Symposium 2015, IPSJ Symposium Series},
  year = 2015,
}

@inproceedings{CTT100684767,
  author = {Ahmed Awad and Atsushi Takahashi},
  title = {A Fast Lithographic Mask Correction Algorithm},
  booktitle = {IEICE Technical Report (VLD2014-153)},
  year = 2015,
}

@inproceedings{CTT100678141,
  author = {Atsushi Takahashi and Ahmed Awad and Yukihide Kohira and Tomomi Matsui and Chikaaki Kodama and Shigeki Nojima and Satoshi Tanaka},
  title = {[Invited] Multi Patterning Techniques for Manufacturability Enhancement in Optical Lithography},
  booktitle = {Proc. the 2014 International Conference on Integrated Circuits, Design, and Verification (ICDV 2014)},
  year = 2014,
}

@inproceedings{CTT100678140,
  author = {Ahmed Awad and Atsushi Takahashi and Satoshi Tanaka and Chikaaki Kodama},
  title = {A Fast Process Variation and Pattern Fidelity Aware Mask Optimization Algorithm},
  booktitle = {Proc. IEEE/ACM 2014 International Conference on Computer-Aided Design (ICCAD 2014)},
  year = 2014,
}

@inproceedings{CTT100676102,
  author = {Ahmed Awad and Atsushi Takahashi and Satoshi Tanaka and Chikaaki Kodama},
  title = {A Process Variability Band Area Reduction Algorithm For Optical Lithography},
  booktitle = {Proc. the 2014 IEICE Society Conference (A-3-6)},
  year = 2014,
}

@inproceedings{CTT100676100,
  author = {Ahmed Awad and Atsushi Takahashi and Satoshi Tanaka and Chikaaki Kodama},
  title = {Mask Optimization With Minimal Number of Convolutions Using Intensity Difference Map},
  booktitle = {Proc. DA Symposium 2014, IPSJ Symposium Series},
  year = 2014,
}

@inproceedings{CTT100676099,
  author = {Ahmed Awad and Atsushi Takahashi and Satoshi Tanaka and Chikaaki Kodama},
  title = {A New Intensity Based Edge Placement Error Optimization Algorithm for Optical Lithography},
  booktitle = {Proc. the 27th Workshop on Circuits and Systems},
  year = 2014,
}

@misc{CTT100711977,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  year = 2016,
}

@misc{CTT100726786,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  year = 2016,
}

@misc{CTT100711979,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  year = 2016,
}

@misc{CTT100711978,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  year = 2016,
}



@phdthesis{CTT100711977,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100726786,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100711979,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  school = {東京工業大学},
  year = 2016,
}

@phdthesis{CTT100711978,
  author = {Ahmed Awad},
  title = {Robust Lithographic Mask Generation For Advanced Technology Nodes},
  school = {東京工業大学},
  year = 2016,
}