@inproceedings{CTT100814197,
  author = {亀井 海聖 and 斉藤 拓海 and 加渡Kado and 大友 明},
  title = {熱硝酸によるβ-Ga2O3 (010)表面のSi不純物除去},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100814195,
  author = {斉藤 拓海 and 加渡Kado and 大友 明},
  title = {窒素ドープ酸化ガリウム薄膜の成長とバンド構造評価},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100821204,
  author = {青山 航平 and 斉藤 拓海 and 亀井 海聖 and 高橋 瑞人 and 相馬 拓人 and 加渡Kado and 大友 明},
  title = {GaS 原料を用いた Ga2O3系混晶の PLD 成長},
  booktitle = {},
  year = 2020,
}

@inproceedings{CTT100799546,
  author = {Takumi Saito and Ryo Wakabayashi and Jung-Soo Lee and Kaisei Kamei and Kohei Yoshimatsu and Motohisa Kado and Akira Ohtomo},
  title = {Suppression of Parallel Conduction at the Interface in β-Ga2O3 Homoepitaxial Layer Using Semi-Insulating Intermediate Layer},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100799545,
  author = {Jung-Soo Lee and Ryo Wakabayashi and Takumi Saito and Kohei Yoshimatsu and Motohisa Kado and Akira Ohtomo},
  title = {High Concentration N-Doping into Ga2O3 Films by Using Pulsed-Laser Deposition with NO Plasma},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100796052,
  author = {李 政洙 and 若林 諒 and 斉藤 拓海 and 吉松 公平 and 加渡Kado and 大友 明},
  title = {PLD法による窒素ドープ酸化ガリウム薄膜の成長と電気特性評価},
  booktitle = {},
  year = 2019,
}

@inproceedings{CTT100796055,
  author = {斉藤 拓海 and 若林 諒 and 李 政洙 and 亀井 海聖 and 吉松 公平 and 加渡Kado and 大友 明},
  title = {半絶縁性中間層によるβ-Ga2O3ホモエピタキシャル層の界面伝導の抑制},
  booktitle = {},
  year = 2019,
}