論文

• Chunfu LIN, Takashi TANAKA, Akio NISHIYAMA, Tadashi SHIOTA, Osamu SAKURAI, Naoki WAKIYA, Kazuo SHINOZAKI, Kouichi YASUDA. Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum, J. Ceram. Soc. Japan, The Ceramic Society of Japan, Vol. 127, No. 6, pp. 443-450, June 2019.

国内会議発表 (査読なし・不明)

• Takashi Tanaka, Naoki Wakiya, Akira Osada, Osamu Sakurai, Kazuo Shinozaki. Effect of [001] Oriented Cr₂O₃ Buffer Layer on Crystalline Al₂O₃ Thin Film, The 3rd International Conference on Science and Technology for Advanced Ceramics (STAC3)., The 3rd International Conference on Science and Technology for Advanced Ceramics (STAC3)., No. 16pP046, June 2009.
• 田中貴司, 吉岡朋彦, 脇谷尚樹, 長田晃, 田中順三, 篠崎和夫. MOCVD法によるAl₂O₃薄膜の作製, 第24回日本セラミックス協会関東支部研究発表会, 第24回日本セラミックス協会関東支部研究発表会, No. 1A01, p. 1, July 2008.

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