@inproceedings{CTT100771190,
  author = {林 俊甫 and 西山昭雄 and 塩田忠 and 安田公 一 and 篠崎和夫},
  title = {Al(CH3)3とO2を用いたMOCVD 法によるAl2O3製膜に及ぼすH2添加の影響},
  booktitle = {日本セラミックス協会2018年年会要旨集},
  year = 2018,
}

@inproceedings{CTT100693288,
  author = {林俊甫 and 田中 敦 and 西山 昭雄 and 塩田 忠 and 櫻井修 and 篠崎 和夫},
  title = {Fabrication of a-Al2O3 thin films at lower temperature by low pressure MOCVD},
  booktitle = {第4回日本セラミックス協会関東支部若手研究発表交流会講演要旨集},
  year = 2014,
}

@inproceedings{CTT100679730,
  author = {Lin and A. Tanaka and N. Ishizaki and A. Nishiyama and N. Wakiya and J. S. Cross and T. Shiota and O. Sakurai and K. Shinozaki},
  title = {Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3},
  booktitle = {Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)},
  year = 2014,
}