論文

• Eisuke Tokumitsu, Kojiro Okamoto, Hiroshi Ishiwara. Low Voltage Operation of Nonvolatile Metal-Ferroelectric-Metal-Insulator-Semiconductor(MFMIS)-Field-Effect-Transistors(FETs) Using Pt/SrBi₂Ta₂O₉/Pt/SrTa₂O₆/SiON/Si Structures, Jpn. J. Appl. Phys., Vol. 40, No. 4B, pp. 2917-2922, Apr. 2001.
• Eisuke Tokumitsu, Koji Aizawa, Kojiro Okamoto, Hiroshi Ishiwara. Impact of face-to-face annealing in preparation of sol-gel-derived SrBi2Ta2O9 thin films, Appl. Phys. Lett., Vol. 76, No. 18, pp. 2609-2611, Mar. 2000.

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