@article{CTT100640462, author = {Takashi Kojima and Junichi Kimura and Muneyasu Suzuki and Kenji Takahashi and Takahiro Oikawa and Yukio Sakashita and Kazumi Kato and Takayuki Watanabe and Tadashi Takenaka and Tomoaki Yamada and Hiroshi Funakubo}, title = {Anisotropic electrical properties in bismuth layer structured dielectrics with natural super lattice structure}, journal = {Appl. Phys. Lett.}, year = 2012, } @article{CTT100585414, author = {Shinichi Ito and Tomoaki Yamada and Kenji Takahashi and Shoji Okamoto and Takafumi Kamo and Hiroshi Funakubo and Ivoyl Koutsaroff and Marina Zelner and Andrew Cervin-Lawry}, title = {Effect of bottom electrode on dielectric property of sputtered-(Ba,Sr) TiO3 films}, journal = {J.Appl.Phys.}, year = 2009, } @article{CTT100564234, author = {HIROSHI FUNAKUBO and Muneyasu Suzuki and Kenji Takahashi and Takayuki Watanabe}, title = {“Temperature Dependency of Dielectric Properties in Epitaxially Grown SrBi4Ti4O15 Films with Different Orientation”}, journal = {Key Engineering Materials}, year = 2008, } @article{CTT100550832, author = {Naoki OHASHI and Kenji Takahashi and Shunichi Hishita and Isao Sakaguchi and HIROSHI FUNAKUBO and Hajime Haneda}, title = {Fabrication of ZnO Microstructures by AnisotropicWet-Chemical Etching}, journal = {Journal of The Electrochemical Society}, year = 2007, } @article{CTT100552737, author = {Joe Sakai and Nobuaki Ito and ShinIchi Ito and Kenji Takahashi and Hiroshi Funakubo}, title = {“Oxygen Content and Magnetic Properties of SrRuO3-δ Thin Films”}, journal = {IEEE Transactions on Magnetics,}, year = 2007, } @article{CTT100552781, author = {Joe Sakai and Nobuaki Ito and Shinichi Ito and Kenji Takahashi and HIROSHI FUNAKUBO}, title = {“Effect of thermal treatment on oxygen stoichiometry and transport properties of SrRuO3 thin films”}, journal = {Appl. Phys. Lett.}, year = 2006, } @article{CTT100507870, author = {Shiro Hino and Makoto Nakayama and Kenji Takahashi and Hiroshi Funakubo and Eisuke Tokumitsu}, title = {Characterization of Hafnium Oxide Thin Films by Sorce Gas Pulse Introduced Metalorganic Chemical Vapor Deposition using Amino-Family Hf Precursors}, journal = {Jpn. J. Appl. Phys.}, year = 2003, } @article{CTT100548651, author = {Kenji Takahashi and Makoto Nakayama and Shiro Hino and Eisuke Tokumitsu and Hiroshi Funakubo}, title = {Growth of Hafnium Oxide Films by Metalorganic Chemical Vapor Deposition Using Oxygen-Free Hf[N(C2H5)2]4 Precursor and Their Properties}, journal = {Integrated Ferroelectrics}, year = 2003, } @article{CTT100507873, author = {Kenji Takahashi and Makoto Nakayama and Shintaro Yokoyama and Takeshi Kimura and Eisuke Tokumitsu}, title = {Preparation of hafnium oxide films from oxygen-free Hf[N(C2H5)2]4 precursor and their properties}, journal = {Applied Surface Science}, year = 2003, } @inproceedings{CTT100564280, author = {Hiroshi Funakubo and Kenji Takahashi and Muneyasu Suzuki and Takashi Kojima and Takayuki Watanabe and Kazumi Kato and Yukio Sakashita and Kazushi Sumitani and Osami Sakata}, title = {“Degradation Free Characteristics of c-axis Oriented Bismuth Layer-Structured Dielectrics”}, booktitle = {}, year = 2007, }