論文

• Shotaro Yamazaki, Yoshifumi Nakamine, Ran Zheng, Masahiro Kouge, Tetsuya Ishikawa, Koichi Usami, Tetsuo Kodera, Yukio Kawano, Shunri Oda. Formation of three-dimensionally integrated nanocrystalline silicon particles by dip-coating method, Japanese Journal of Applied Physics, Vol. 54, pp. 105001-5, Sept. 2015.
• Kazufumi Ikemoto, Yoshifumi Nakamine, Yukio Kawano, Shunri Oda. In-Situ Monitoring of Silicon Nanocrystal Deposition with Pulsed SiH4 Supply by Optical Emission Spectroscopy of Ar Plasma, Japanese Journal of Applied Physics, Vol. 53, No. 11, pp. 116102 (4 pages), Oct. 2014.
• J.Hasegawa, K.Konishi, Y.Nakamura, K.Otsuka, S.Nakata, Y. Nakamine, T. Nishimura, M. Hatano. Investigation of Stacking Faults Affecting on Reverse Leakage Current of 4H-SiC Junction Barrier Schottky Diodes Using Device Simulation, Materials Science Forum, Vol. 828, pp. 778-780, Feb. 2014.
• J. T. Song, H. Mashiko, M. Kamiya, Y. Nakamine, A. Ohtomo, T. Iwasaki, M. Hatano. Improved visible light driven photoelectrochemical properties of 3C-SiC semiconductor with Pt nanoparticles for hydrogen generation, Applied Physics Letters, The American Institute of Physics, Volume 103, 213901 (5 pages), Nov. 2013.  公式リンク  
  
• SHUNRI ODA, Jannatul Susoma, Yoshifumi Nakamine, Tetsuo Kodera. Channel Length Scaling and Surface Nitridation of Silicon Nanocrystals for High Performance Electron Devices, Japanese Journal of Applied Physics, Vol. 52, pp. 04CH08 (4 pages), Mar. 2013.
• Y. Nakamine, T. Kodera, K. Uchida, S. Oda. Removal of Surface Oxide Layer from Silicon Nanocrystals by Hydrogen Fluoride Vapor Etching, Japanese Journal of Applied Physics, Vol. 50, pp. 115002-1-4, Nov. 2011.
• Y. Nakamine, N. Inaba, T. Kodera, K. Uchida, R. N. Pereira, A. R. Stegner, M. S. Brandt, M. Stutzmann, S. Oda. Size Reduction and Phosphorus Doping of Silicon Nanocrystals Prepared by a Very High Frequency Plasma Deposition System, Japanese Journal of Applied Physics, Vol. 50, pp. 025002, Feb. 2011.
• Y. Nakamine, T. Kodera, K. Uchida, S. Oda. Removal of Surface Oxide Layer from Silicon Nanocrystals by Hydrogen Fluoride Vapor Etching, Vol. 50, No. 115002, 4pages, 2011.
• D. Hippo, Y. Nakamine, K. Urakawa, Y. Kawata, Y. Tsuchiya, H. Mizuta, N. Koshida, S. Oda. Formation Mechanism of 100 nm-Scale Periodic-Structures in Silicon Using Magnetic-Field-Assisted Anodization, Japanese Journal of Applied Physics, Vol. 47, pp. 7398-7402, Sept. 2008.

国際会議発表 (査読有り)

• Ayse Seyhan, Keiki Fukumoto, Yuuki Yamada, Takashi Matsuki, Ken Onda, Shin-ya Koshihara, Yoshifumi Nakamine, Kazufumi Ikemoto, Kengo Funaki, Shunri Oda. Direct Imaging of Carrier Dynamics in Si Nanocrystals by Using Femtosecond Time-Resolved Photoemission Electron Microscopy, Materials Research Society, Apr. 2014.
• J. Hasegawa, K.Konishi, Y.Nakamura, K.Otsuka, Y.Nakamine, T.Nishimura, M.Hatano. Investigation of Stacking Faults Affecting on Reverse Leakage Current of 4H-SiC Junction Barrier Schottky Diodes Using Device Simulation, ICSCRM2013, Oct. 2013.
• JunTae Song, Y.Nakamine, T.Iwasaki, Mutsuko Hatano. Pt co-catalyst effect for improving 3C-SiC photo-anode properties, 2013 JSAP-MRS Joint Symposia, Sept. 2013.
• K.Ikemoto, Y.Nakamine, Y.Kawano, S.Oda. In-Situ Monitoring of Silicon Nanocrystal Deposition with Pulsed SiH₄ Supply by Optical Emission Spectroscopy of Ar Plasma, Solid State Devices and Materials Conference, Sept. 2013.
• Jun Tae Song, Y.Nakamine, T. Iwasaki, M. Hatano. Enhancement of 3C-SiC Semiconductor Photo-anode Performance for Water Splitting using Pt Co-catalysts, IEEE EDS WIMNACT-37, Future Trend of Nanodevices and Photonics, Feb. 2013.
• A. Boudraa, A. Seyhan, Y. Nakamine, Y. Ogawa, F. Minami, Y. Kawano, S. Oda. Surface Plasmon Enhanced Light Emission from Silicon Nanocrystals, IEEE EDS WIMNACT-37, P-2, 2013.
• Yoshifumi Nakamine, Jannatul Ferdous Susoma, Ran Zheng, Nobuhiro Kondo, Mohammad R. T. Mofrad, Michiel van der Zwan, Johan van der Cingel, Tetsuo Kodera, Yukio Kawano, Ken Uchida, Mutsuko Hatano, Ryoichi Ishihara, Shunri Oda. Electrical and Optical Properties of Silicon Nanocrystals Prepared by Very High Frequency Plasma Deposition System, 8th International Nanotechnology Conference, May 2012.
• Jannatul Susoma, Nakamine Yoshifumi, kouichi usami, Tetsuo Kodera, Yukio Kawano, Shunri Oda. Scaling of Channel Length for Highly Conductive Silicon Nanocrystal Films, Solid State Devices and Materials Conference, 2012.
• Yoshifumi Nakamine, Ken Someno, Hiroki Nikaido, Masahiro Kouge, Tetsuo Kodera, Yukio Kawano, Ken Uchida, Mutsuko Hatano, Shunri Oda. Evaluation of Electrical and Optical Property and High-Density Assembly of Nano-Crystalline Silicon Dot Array for Device Application, G-COE PICE International Symposium and IEEE EDS Minicolloquium on Advanced Hybrid Nano Devices: Prospects by World’s Leading Scientists, P-3, Oct. 2011.
• Yoshifumi Nakamine, Tetsuo Kodera, Ken Uchida, Mutsuko Hatano, Shunri Oda. Electrical Property of Nano-Crystalline Silicon Thin-Films Prepared by Very High Frequency Plasma Deposition System, 24th International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 24), 4C4-4, Aug. 2011.
• Yoshifumi Nakamine, Mohammad R. T. Mofrad, Michiel van der Zwan, Johan van der Cingel, Tetsuo Kodera, Ken Uchida, Mutsuko Hatano, Ryoichi Ishihara, Shunri Oda. Electrical Property of Nano-Crystalline Silicon Thin-Films Transistors Prepared by Very High Frequency Plasma Deposition System, IEEE Silicon Nanoelectronics Workshop, No. 5-6, June 2011.
• Yoshifumi Nakamine, Ken Someno, Hiroki Nikaido, Masahiro Kouge, Tetsuo Kodera, Ken Uchida, Mutsuko Hatano, Shunri Oda. Evaluation of Electrical and Optical Property and High-Density Assembly of Nano-Crystalline Silicon Dot Array for Device Application, 7th International Nanotechnology Conference on Communication and Cooperation (INC7), May 2011.
• Y. Nakamine, Michiel van der Zwan, Johan van der Cingel, Tetsuo Kodera, Ken Uchida, Ryoichi Ishihara, Shunri Oda. Laser Annealing of Silicon Nanocrystals Thin-films Prepared by VHF Plasma Deposition System, Materials Research Society, A9.5, Apr. 2011.
• Y. Nakamine, T. Kodera, K. Uchida, S. Oda. Removal of Surface Oxide Layer from Silicon Nanocrystals by HF Vapor Etching, 22nd Int. Microprocess and Nanotechnology Conference (MNC 2009), Oct. 2009.
• Y.Nakamine, T.Kodera, K.Uchida, Shunri Oda. Phosphorous-Doping in Silicon Nanocrystals by using VHF Plasma, G-COE PICE International Symposium on Silicon Nano Devices in 2030, Oct. 2009.
• D. Hippo, Y. Nakamine, K. Uchida, S. Oda. Thermotherapy for Cancer Using Silicon Nanocrystals, G-COE PICE International Symposium on Silicon Nano Devices in 2030, Oct. 2009.
• 筆宝大平, 中峯嘉文, 内田 健, 小田俊理. レーザ照射によるナノ結晶シリコンの温度上昇の観測, 第70回応用物理学会学術講演会, Sept. 2009.

国内会議発表 (査読有り)

• Jun Tae Song, Yoshifumi Nakamine, Takayuki Iwasaki, Mutsuko Hatano. Enhanced Photoelectrochemical Properties of 3C-SiC by Pt co-catalysts, 第60回応用物理学会春季学術講演会, Mar. 2013.

国内会議発表 (査読なし・不明)

• 池本和史, 中峯嘉文, 河野行雄, 小田俊理. SiH4パルス供給によるArプラズマ発光の増大と生成したシリコンナノ結晶の関係, 第74回応用物理学会秋季学術講演会, Sept. 2013.
• 近藤信啓, 舩木健伍, 中峯嘉文, 宇佐美浩一, 小寺哲夫, 河野行雄, 小田俊理. VHFプラズマにより作製したナノ結晶シリコン中のトラップの評価, 第74回応用物理学会秋季学術講演会, Sept. 2013.
• 近藤信啓, 染野健, 中峯嘉文, 宇佐美浩一, 小寺哲夫, 河野行雄, 小田俊理. VHFプラズマにより作製したナノ結晶シリコンのフッ硝酸による粒径縮小, 2012年 秋季 第73回応用物理学会学術講演会, Sept. 2012.
• Jannatul Susoma, Yoshifumi Nakamine, Nobuhiro Kondo, Tetsuo Kodera, kouichi usami, Yukio Kawano, SHUNRI ODA. Channel Length Scaling and Surface Nitridation of Silicon Nanocrystals for High Performance Electron Device, 2012年 秋季 第73回応用物理学会学術講演会, Sept. 2012.
• 中峯嘉文, 小寺哲夫, 河野行雄, 内田 建, 小田俊理. 無水フッ酸エッチングによるシリコンナノ結晶の自然酸化膜の除去, 第59回応用物理学関係連合講演会, 17p-GP11-9, Mar. 2012.
• Jannatul susoma, 中峯嘉文, 近藤信啓, 小寺哲夫, 宇佐美浩一, 河野行雄, 小田俊理. Channel Length Scaling and Surface Nitridation of Silicon Nanocrystals for High Performance Electron Device, 第73回応用物理学会学術講演会, 2012.
• 中峯嘉文, Mohammad Mofrad, Michiel Van Der Zwan, Johan Van Der Cingel, 小寺哲夫, 内田 建, 石原良一, 小田俊理. レーザアニーリングによるシリコンナノ結晶薄膜の電気特性への影響, 第72回応用物理学会学術講演会, pp. 2p-ZG-2, Aug. 2011.
• 中峯嘉文, Michiel Van Der Zwan, Johan Van Der Cingel, 小寺哲夫, 内田 建, 石原良一, 小田俊理. VHF プラズマにより作製されたシリコンナノ結晶のレーザアニーリング, 第58回応用物理学関係連合講演会, 27p-BA-4, Mar. 2011.
• 中峯嘉文, 小寺哲夫, 内田 建, 小田俊理. VHFプラズマパワーの変化によるシリコンナノ結晶の縮小化, 第57回応用物理学関係連合講演会, 17a-TG-10, Mar. 2010.
• 中峯嘉文, 内田 建, 小田俊理. VHFプラズマにより作製されたSi量子ドットのPドーピング, 第56回応用物理学関係連合講演会, Apr. 2009.
• Xin Zhou, 中峯嘉文, 内田 建, 小田俊理. Trap effects on carrier transport in Si nanocrystals thin film, 第56回応用物理学関係連合講演会, Mar. 2009.

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