@inproceedings{CTT100524014,
  author = {Katsunobu Nishihara and Kazumi Fujima and Hiroyuki Furukawa and K.Gamada and T.Kagawa and Y-G.Kang and T.Kato and Tohru Kawamura and Fumihiro Koike and R.More and H. Maehara and M.Murakami and Takeshi Nishikawa and A.Sasaki and A.Sunahara and H.Tanuma and V.Zhakhovskii and Shinsuke Fujioka and Hiroaki Nishimura and Yoshinori Shimada and S.Uchida and N.Miyanaga and Y.Izawa},
  title = {Theoretical Modeling and Optimization of LPP EUV Light Source},
  booktitle = {4th International Extreme UltraViolet Lithography (EUVL) Symposium, San Diego, California, USA, 07-09 November, 2005.},
  year = 2005,
}