@article{CTT100647587,
  author = {H.D. Trinh and Yueh-Chin Lin and H.C. Wang and C.H. Chang and Kuniyuki KAKUSHIMA and HIROSHI IWAI and Takamasa Kawanago and Y.G. Lin and C.M. Chen and Y.Y.Wong and G.N. Huang and M. Hudait and E.Y. Chang},
  title = {Effect of Postdeposition, Annealing Temperatures on Electrical Characteristics of Molecular-Beam-Deposited HfO2 on n-InAs/InGaAs Metal-Oxide-Semiconductor Capacitors},
  journal = {Applied Physics Express},
  year = 2012,
}

@inproceedings{CTT100585316,
  author = {船水清永 and Yueh-Chin Lin and 角嶋邦之 and パールハットアヘメト and 筒井一生 and 杉井信之 and Edward Yi Chang and 服部健雄 and 岩井洋},
  title = {High-k ゲート絶縁膜を用いたInxGa1-xAs MOS構造の研究},
  booktitle = {第56回応用物理学関係連合講演会予稿集},
  year = 2009,
}