@article{CTT100615405, author = {Xun Gu and Takenao Nemoto and Akinobu Teramoto and Takashi Ito and Tadahiro Ohmi}, title = {Effect of Additives in Organic Acid Solutions for Post-CMP Cleaning on Polymer Low-k Fluorocarbon}, journal = {J. Electrochem. Soc.}, year = 2009, } @article{CTT100615409, author = {Katsumasa Suzuki and Yoshio Ishihara and Kaoru Sakoda and Yasuyuki Shirai and Akinobu Teramoto and Masaki Hirayama and Tadahiro Ohmi and Takayuki Watanabe and Takashi Ito}, title = {Inductively coupled plasma generator for an environmentally benign perfluorocarbon abatement system}, journal = {J. Vac. Sci. Technol. A}, year = 2009, } @article{CTT100615370, author = {Katsumasa Suzuki and Yoshio Ishihara and Kaoru Sakoda and Yasuyuki Shirai and Akinobu Teramoto and Masaki Hirayama and Tadahiro Ohmi and Takayuki Watanabe and Takashi Ito}, title = {High-Efficiency PFC Abatement System Utilizing High-Efficiency PFC Abatement System Utilizing Immobilization}, journal = {IEEE Trans. on Semicon. Manufacturing}, year = 2008, } @article{CTT100615344, author = {Tadahiro Ohmi and Hiraku ISHIKAWA and Toshihisa NOZAWA and Takaaki MATSUOKA and Akinobu TERAMOTO and Masaki HIRAYAMA and Takashi ITO and Tadahiro OHMI}, title = {Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-k Copper Metallization}, journal = {Japanese Journal of Applied Physics}, year = 2008, } @article{CTT100615380, author = {Takenao Nemoto and Hiroshi Imai and Akinobu Teramoto and Takashi Ito and Shigetoshi Sugawa and Tadahiro Ohmi}, title = {Tantalum Nitride Sputtering Deposition with Xe on Fluorocarbon for Cu Interconnections}, journal = {Journal of The Electrochemical Society}, year = 2008, } @inproceedings{CTT100615492, author = {S.Morishita and T.Goto and I.Akutsu and K.Ohyama and T.Ito and T.Ohmi}, title = {High-Speed Gas Replacement in Plasma Process Chamber due to Precise Down-Flow of Gas Using a Upper Shower Plate}, booktitle = {Dry Process International Symposium (DPS2008)}, year = 2008, } @inproceedings{CTT100615489, author = {Sadaharu Morishita and Tetsuya Goto and Takashi Ito and Tadahiro Ohmi}, title = {Study on Gas Replacement Time in Plasma Process Chamber for Realizing Ideal Down Flow of Gas without Disturbance}, booktitle = {Int. Symp. on Semicon. Manufacturing 2008 (ISSM2008)}, year = 2008, }