@article{CTT100634514, author = {Takashi Ito and Ichiro Kato and Takao Nozak and Tetsuo Nakamura and Hajime Ishikawa}, title = {Plasma enhanced Thermal Nitridation of Silicon}, journal = {Applied Phisics Letters}, year = 1981, } @article{CTT100634511, author = {Takashi Ito and Takao Nozaki and Hajime Ishikawa}, title = {Direct Thermal Nitridation of Silicon Dioxide Films in Ammonia Gas}, journal = {Journal of The Electrochemical Society}, year = 1980, } @article{CTT100634512, author = {Takashi Ito and Hideki Arakawa and Takao Nozaki and Hajime Ishikawa}, title = {Retardation of Destructive Breakdown of SiO2 Films Annealed in Ammonia Gas}, journal = {Journal of The Electrochemical Society}, year = 1980, } @article{CTT100634507, author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda and Yukio Fukukawa}, title = {Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen}, journal = {Journal of The Electrochemical Society}, year = 1979, } @article{CTT100634508, author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda}, title = {Low Voltage Alterable EAROM Cells with Nitride-Barrier Avalanche Injection MIS(NAMIS)}, journal = {IEEE TRANSACTIONS ON ELECTRON DEVICES}, year = 1979, } @article{CTT100634506, author = {Takashi Ito and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda}, title = {Thermally Grown Silicon Nitride Films for High Performance MNS Devices}, journal = {Applied Phisics Letters}, year = 1978, } @inproceedings{CTT100634598, author = {Takashi Ito and Takao Nozaki and Hajime Ishikawa and Yukio Fukukawa}, title = {Thermal Nitride Gate FET Technology for VLSI Devices}, booktitle = {ISSCC Dig. of Tech. Papers}, year = 1980, } @inproceedings{CTT100634595, author = {Takashi Ito and Takao Nozaki and Hideki Arakawa and Shinpei Hijiya and Masaichi Shinoda and Yukio Fukukawa}, title = {Thermally Nitrided Silicon Films By Direct Reaction}, booktitle = {Abs. of 150th ECS Fall Meeting}, year = 1976, }