@article{CTT100634509,
  author = {Takashi Ito and Hajime Ishikawa and Yukio Fukukawa},
  title = {Thermal Nitridation of Silicon in Advanced LSI Processing},
  journal = {Japanese Journal of Applied Physics. Supplement},
  year = 1980,
}

@article{CTT100634507,
  author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda and Yukio Fukukawa},
  title = {Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen},
  journal = {Journal of The Electrochemical Society},
  year = 1979,
}

@inproceedings{CTT100634598,
  author = {Takashi Ito and Takao Nozaki and Hajime Ishikawa and Yukio Fukukawa},
  title = {Thermal Nitride Gate FET Technology for VLSI Devices},
  booktitle = {ISSCC Dig. of Tech. Papers},
  year = 1980,
}

@inproceedings{CTT100634599,
  author = {Takashi Ito and Hajime Ishikawa and Yukio Fukukawa},
  title = {Thermal Nitridation of Silicon in Advanced LSI Processing},
  booktitle = {Ext. Abs. on 12th Conf. on SSDM},
  year = 1980,
}

@inproceedings{CTT100634595,
  author = {Takashi Ito and Takao Nozaki and Hideki Arakawa and Shinpei Hijiya and Masaichi Shinoda and Yukio Fukukawa},
  title = {Thermally Nitrided Silicon Films By Direct Reaction},
  booktitle = {Abs. of 150th ECS Fall Meeting},
  year = 1976,
}